AONano 351-3W-3K ND:YLF UV Laser

Specifications

Avg. Power: 3 W
Wavelength: 351 nm
Repetition Rate: 1 – 20 kHz
Spatial Mode (M^2): 1.2
Pulse Duration: 30 ns
Pulse-to-Pulse Stability (RMS): 2 %
Cooling: Air
Spatial Mode: TEM00
Beam Roundness: >90%
Pulse Width (ns): <40ns @1kHz
Pulse Energy (mJ @ 1kHz): >0.2mJ
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Features


  • Innovative End-Pumping Technology: Enhances performance and efficiency, ensuring optimal laser output.

  • Air-Cooling (Average Power Up to 6W): Provides effective thermal management, maintaining consistent performance.

  • Excellent Beam Quality, Pulse Stability & Point Stability: Guarantees precise and reliable laser operations for demanding applications.

  • Patent Pending Harmonic Conversion Technologies: Offers advanced capabilities for a wide range of industrial applications.

  • Ultra-Compact & Light-Weight: Facilitates easy integration into existing systems and setups.

  • Brand-New Focusing Optics: Ensures superior focusing capabilities for enhanced precision.

  • Field-Replaceable Diode: Simplifies maintenance and reduces downtime with easy diode replacement.

  • 24/7 Proven Reliability: Designed for continuous operation, meeting the demands of production environments.

  • Low Operational Cost: Minimizes expenses with efficient operation and maintenance.

Applications


  • Micromachining: Ideal for precision micromachining applications, providing high accuracy and fine detail.

  • Electronics Manufacturing: Used in the production of electronic components, ensuring reliability and precision.

  • Medical Device Fabrication: Suitable for manufacturing medical devices where precision and cleanliness are crucial.

  • Semiconductor Processing: Essential for processes requiring high precision and stability in semiconductor manufacturing.

  • Material Processing: Effective for processing a variety of materials, including metals, plastics, and composites.

  • Research and Development: Utilized in R&D settings for developing new laser applications and technologies.

  • UV Lithography: Employed in UV lithography for patterning and etching applications in the production of microelectronics.

  • Scientific Applications: Used in scientific research requiring high beam quality and pulse stability.

  • Engraving and Marking: Perfect for high-precision engraving and marking on various surfaces.

  • 3D Printing: Enhances the precision and quality of 3D printed objects, particularly in UV-sensitive materials.