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Description

Novanta proudly presents the Finesse DPSS Continuous Wave Laser Series, a revolutionary line of laser solutions meticulously engineered to meet the exacting demands of cutting-edge photonics applications. Developed by a team of experts with decades of experience in the field, these lasers embody the pinnacle of innovation, delivering unparalleled power, precision, and performance for a wide range of scientific and industrial endeavors.

At the heart of the FINESSE series lies a commitment to precision engineering and technological excellence. Leveraging state-of-the-art components and advanced design methodologies, these lasers offer top-of-the-line performance with power outputs reaching up to 16W. Whether you're engaged in Ti:S pumping, semiconductor inspection, analytical research, micromachining, or fine material processing, the FINESSE series provides the power and stability you need to achieve consistent, reliable results.

One of the hallmarks of the FINESSE series is its ultra-low noise operation and exceptional power stability. Through innovative cavity designs and advanced noise cancellation electronics, these lasers ensure minimal noise interference, enabling you to capture even the most delicate signals with precision and accuracy. With power stability of less than 0.1% RMS and noise levels as low as 0.02%, the FINESSE series sets a new standard for performance in the industry.

What sets the FINESSE series apart is its unique set of features tailored to the specific needs of photonics professionals. The inclusion of Carrier Envelope Phase (CEP) stabilization technology allows for direct modulation of output, eliminating the need for costly and complex external components. Additionally, the integration of Pure™ technology ensures noise levels below 0.02%, guaranteeing pristine signal quality for even the most demanding applications.

Designed with versatility and ease of use in mind, the FINESSE series offers a range of customizable options to suit your specific requirements. From field-replaceable components for easy maintenance to intelligent control units with PowerLoQ™ technology for enhanced stability, these lasers are engineered for seamless integration into your existing workflow. With options for fiber coupling, LabView drivers, and remote control capabilities, the FINESSE series adapts to your needs, allowing you to focus on your research or production goals without compromise.

Backed by Novanta's decades of experience and unwavering commitment to customer satisfaction, the FINESSE DPSS Continuous Wave Laser Series represents the cutting edge of photonics technology. With a comprehensive warranty and dedicated support from our global network of service centers, you can trust Novanta to deliver reliable performance and exceptional value, every step of the way.

Finesse DPSS Continuous Wave Laser Series, Ultra Low Noise, 16W

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Specifications

Wavelength: 532 nm
Max Output Power: 14000 mW
Cooling Method: Air-Cooled, Fan-cooled, Passive cooling, Active cooling, Heat sink
Tunability: Fixed Wavelength
Control Interface: Digital Control
Laser Series: FINESSE DPSS continuous wave
Wavelength: 532 nm
Power: 14 - 16 W
Beam Diameter: 2.25 mm ± 0.25 mm
Spatial Mode: TEM00
Ellipticity: < 1:1.15
Bandwidth: 50 GHz
Beam Divergence: < 0.4 mrad
M²: < 1.1
Modulation Depth (finesse 532 Pure CEP): ±1%
Modulation Behaviour (finesse 532 Pure CEP): < 1 MHz
Phase Behaviour (finesse 532 Pure CEP): -90° for 750 kHz
Power Stability (RMS) Finesse 532: < 0.10%
Power Stability (RMS) Finesse 532 Pure: < 0.100% (< 10 W); < 0.050% (10 W+)
Power Stability (RMS) Finesse 532 Pure CEP: < 0.100% (< 10 W); < 0.050% (10 W+)
Noise (RMS) Finesse 532: < 0.1%
Noise (RMS) Finesse 532 Pure: < 0.030% (< 10 W); < 0.020% (10 W+)
Noise (RMS) Finesse 532 Pure CEP: < 0.030% (< 10 W); < 0.020% (10 W+)
Noise Bandwidth: 10 Hz - 100 MHz
Beam Pointing Stability: < 2 µrad/°C
Polarization Ratio: > 100:1
Polarization Direction: Horizontal
Coherence Length: 6 mm
Noise (pure Technology): < 0.02 %

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Features

  • High-Power 532 nm DPSS CW Output (up to 16 W)
    Delivers 14–16 W continuous wave at 532 nm, providing ample power for Ti:Sapphire pumping, semiconductor inspection, micromachining, and precision materials processing tasks.
  • Ultra-Low Noise Performance (<0.02% RMS with pure™ technology)
    Incorporates Novanta’s pure™ technology to achieve <0.02% RMS intensity noise (typical) and specified <0.03% (<10 W) / <0.02% (≥10 W) over 10 Hz–100 MHz, enabling highly sensitive diagnostic and analytical applications.
  • Exceptional Long-Term Power Stability (<0.05% RMS)
    Novel cavity design and integrated control electronics deliver <0.10% RMS power stability (down to <0.05% above 10 W). Typical measurements show ~0.01% noise and <0.05% power drift over 70 hours for repeatable, reliable measurements.
  • Advanced Noise Cancellation Electronics
    Active electronic stabilization minimizes intensity fluctuations and environmental perturbations, delivering a clean, quiet beam ideally suited for high-resolution spectroscopy, interferometry, and metrology.
  • Carrier-Envelope Phase (CEP) Stabilization Option
    The finesse 532 pure CEP model integrates a CEP feedback loop that interfaces directly with an f–2f interferometer signal, simplifying phase locking in ultrafast systems and improving CEP stability in attosecond and high-field physics experiments.
  • Eliminates Need for External AOM in CEP Setups
    CEP-capable versions allow direct laser output modulation, removing the requirement for an external acousto-optic modulator (AOM). This reduces system complexity, optical loss, and alignment effort in CEP-locked Ti:Sapphire and OPCPA systems.
  • Fast Direct Modulation for CEP Control
    finesse 532 pure CEP provides ±1% modulation depth with modulation bandwidth <1 MHz and phase behaviour of –90° at 750 kHz, enabling precise, high-speed CEP feedback and active intensity control.
  • Excellent Beam Quality (TEM00, M2 < 1.1)
    Delivers a near-diffraction-limited TEM00 output with M2 < 1.1, ensuring tight focusing, high coupling efficiency into fibers and nonlinear crystals, and uniform illumination for inspection systems.
  • Well-Defined Beam Diameter and Low Divergence
    Provides a nominal 2.25 mm ± 0.25 mm beam diameter with <0.4 mrad divergence for controlled beam propagation and consistent focusing performance in complex optical setups.
  • High Spatial Symmetry and Low Ellipticity
    Beam ellipticity < 1:1.15 supports circular, symmetric focusing, improving spot quality in micromachining, laser writing, and precision imaging applications compared with less symmetrical beams.
  • Stable Beam Pointing (< 2 µrad/°C)
    Beam pointing stability better than 2 µrad/°C minimizes alignment drift due to temperature changes, crucial for long-term experiments, automated inspection lines, and multi-pass or multi-stage optical systems.
  • High Polarization Extinction Ratio (>100:1, Horizontal)
    Linearly polarized output with >100:1 polarization ratio (horizontal) ensures high efficiency in polarization-sensitive optics, nonlinear frequency conversion, and interferometric measurements.
  • Optimized for Ti:Sapphire Pumping
    532 nm wavelength, high CW power, ultra-low noise, and exceptional stability make finesse lasers ideally matched to pump Ti:Sapphire oscillators and amplifiers, supporting narrow linewidth and low-noise ultrafast pulse generation.
  • Ideal for Semiconductor Inspection & Metrology
    Superior stability, low noise, and excellent beam quality enable high-contrast imaging, defect inspection, and precision metrology in semiconductor manufacturing and other industrial inspection environments.
  • High Wall-Plug Efficiency and Reduced Thermal Load
    Efficient diode-pumped design offers outstanding wall-plug efficiency, reducing power consumption, heat dissipation, and cooling infrastructure requirements for easier system integration.
  • Designed for Demanding Scientific and Industrial Applications
    Engineered for laser-based diagnostics, analytical instruments, micromachining, fine materials processing, and precision spectroscopy where beam stability and reliability are critical.
  • Narrow Optical Bandwidth (~50 GHz)
    50 GHz linewidth supports applications requiring good temporal coherence and stable spectral characteristics, such as high-resolution Raman spectroscopy, interferometry, and seeding.

Applications

  • Ti:Sapphire Pumping for Ultrafast Lasers – High‑power 16 W, 532 nm CW output with ultra‑low noise and excellent power stability makes the finesse laser series ideal for pumping mode‑locked Ti:Sapphire oscillators in research and industrial ultrafast systems.
  • Carrier Envelope Phase (CEP) Stabilization – The finesse 532 pure CEP variant with integrated CEP feedback loop enables direct modulation using f‑2f interferometer signals, providing precise CEP locking for few‑cycle pulse generation and attosecond science experiments.
  • Semiconductor Wafer Inspection and Metrology – Superior beam quality (TEM00, M² < 1.1), ultra‑low noise (<0.02% RMS), and exceptional power stability (<0.05%) ensure high signal‑to‑noise ratio in bright‑field/dark‑field wafer inspection, mask inspection, and defect review tools.
  • Flat Panel Display (FPD) and Micro‑OLED Inspection – Stable, low‑noise green illumination supports high‑resolution inspection of TFT arrays, micro‑OLED structures, and display backplanes where repeatable intensity and spot size are critical.
  • Precision Optical Metrology – Excellent pointing stability and coherence length make the finesse lasers suitable for high‑accuracy interferometry, surface profilometry, optical testing of lenses and coatings, and other precision metrology setups.
  • Holography and Digital Holographic Microscopy – Single‑mode, low‑noise, and stable 532 nm output is ideal for recording and reconstructing high‑fidelity holograms, digital holographic microscopy, and 3D surface characterization.
  • Confocal and Multiphoton Microscopy (Pumping Role) – As a pump source for Ti:Sapphire or OPO systems, the finesse laser supports advanced microscopy modalities including deep‑tissue multiphoton imaging, FLIM, and nonlinear microscopy in life sciences and materials research.
  • Raman Spectroscopy (Pumped Sources and Nonlinear Modules) – Ultra‑stable power at 532 nm is optimal for pumping narrow‑band or tunable sources used in Raman spectroscopy, CARS, and SERS, where intensity fluctuations directly impact signal quality.
  • Nonlinear Frequency Conversion – High continuous‑wave power with excellent beam quality is well suited to pumping OPOs, OPGs, and other nonlinear frequency‑conversion stages to generate visible, UV, or mid‑IR wavelengths for spectroscopy and imaging.
  • Laser Lithography and Direct Laser Writing – Stable, high‑brightness green beam enables precise exposure in maskless lithography, micro‑patterning, and direct laser writing of photonic structures, micro‑fluidic channels, and micro‑optical components.
  • Semiconductor Micromachining and Scribing – High power and low divergence support fine scribing, dicing, and edge isolation of wafers, silicon carbide, and compound semiconductor substrates when used in scanning or fixed‑beam machining platforms.
  • Solar Cell and Photovoltaic Processing – Reliable, low‑noise power delivery at 532 nm is advantageous for laser edge isolation, patterning of thin‑film solar cells, and micro‑structuring of high‑efficiency photovoltaic devices.
  • Precision Thin‑Film Patterning – High stability and beam quality are suited to patterning ITO layers, metal tracks, and dielectric coatings in electronics, photonics, and display manufacturing lines.
  • Micro‑Optics Fabrication – Enables fabrication and trimming of diffractive optical elements (DOEs), microlens arrays, waveguides, and integrated photonics devices where consistent exposure is necessary for tight dimensional control.
  • Optical Data Storage and Testing – Serves as a reference or test source for optical storage components, pickup heads, and media characterization where low jitter and intensity stability are required.
  • Atomic, Molecular, and Optical Physics Experiments – Narrow bandwidth and low noise at 532 nm make the finesse lasers suitable for optical pumping, cooling schemes (as pump or frequency‑doubled source), trapping, and precision spectroscopy of atomic and ionic transitions.
  • Frequency Comb Pumping – High‑stability CW output is well matched for pumping frequency comb generators and enhancement cavities where CEP‑controlled Ti:Sapphire systems are used for metrology and optical clock experiments.
  • Interferometric Vibration and Displacement Sensing – Excellent power and pointing stability enable high‑sensitivity interferometers for vibration analysis, nanometer‑scale displacement sensing, and precision alignment systems.

Frequently Asked Questions

What is the Novanta / Laser Quantum finesse 532 DPSS continuous wave laser series and what are its main features?
The finesse 532 DPSS continuous wave (CW) laser series from Novanta (Laser Quantum) is a family of high‑power 532 nm single‑frequency lasers designed for demanding applications such as Ti:Sapphire (Ti:S) pumping, carrier‑envelope phase (CEP) locked systems, semiconductor inspection, precision metrology and advanced microscopy. It offers up to 14–16 W output power at 532 nm with a TEM00 spatial mode, M² < 1.1, low divergence
What are the differences between finesse 532, finesse 532 pure and finesse 532 pure CEP models?
All three models operate at 532 nm with 14–16 W CW output and similar beam quality, but they target slightly different use cases: • finesse 532: The base high‑power DPSS CW model for general high‑precision applications where low noise and good stability are required, such as micromachining, inspection and general Ti:S pumping.
Why is the finesse 532 series well suited for Ti:Sapphire pumping and CEP‑locked ultrafast laser systems?
Ti:Sapphire oscillators and amplifiers require a highly stable, low‑noise green pump with good beam quality for optimum performance and minimal pointing or power‑drift‑induced noise in the ultrafast output. The finesse 532 series offers: • High CW pump power: 14–16 W at 532 nm, ideal for pumping high‑average‑power Ti:S oscillators and regenerative amplifiers.
What is pure™ technology and how does it improve laser noise and stability compared to standard DPSS lasers?
pure™ technology is Laser Quantum’s proprietary combination of cavity design, optical filtering and advanced electronic control used in the finesse 532 pure and finesse 532 pure CEP models. It is engineered to suppress relaxation oscillations, pump‑induced fluctuations and electronic noise sources that normally limit DPSS laser performance.
What beam quality and coherence characteristics does the finesse 532 series offer, and why are they important?
The finesse 532 lasers are designed as high‑specification TEM00 sources. They provide: • Spatial mode: TEM00 with M² < 1.1, enabling tight, diffraction‑limited focusing. • Beam size and shape: Beam diameter of 2.25 mm ± 0.25 mm at the output and ellipticity
How does the integrated CEP feedback in the finesse 532 pure CEP reduce system cost and complexity?
The finesse 532 pure CEP model incorporates a built‑in feedback loop that can use the error signal from an f‑2f interferometer to directly modulate the laser output with ±1 % depth
What typical applications use the finesse 532 DPSS CW lasers, and how does high wall‑plug efficiency benefit these applications?
The finesse 532 series is widely used in Ti:Sapphire pumping (oscillators and amplifiers), CEP‑locked ultrafast systems, semiconductor and wafer inspection, precision metrology, high‑end microscopy, holography, Raman and other nonlinear spectroscopy, and fine material processing or micromachining where a stable, high‑quality 532 nm beam is required. Its high wall‑plug efficiency means that more of the electrical input power is converted into usable optical power, resulting in lower waste heat compared with less efficient DPSS lasers. In practical terms this reduces cooling and thermal management requirements, simplifies system integration, lowers operating costs and improves long‑term reliability—an advantage for OEMs integrating the finesse 532 into compact or thermally constrained platforms such as inspection tools, scientific laser systems and industrial workstations.

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