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Description

The OPTOMAN PP-UVFS-25.4-6.35-TFP86 is a premium thin-film laser polarizer engineered for demanding 1064 nm laser applications. Manufactured on a UV fused silica substrate and coated using advanced ion beam sputtering (IBS) technology, this optic provides exceptional polarization performance with greater than 99.9% reflection for s-polarized light and more than 98% transmission for p-polarized light at a 45° angle of incidence. An extinction ratio (Tp/Ts) exceeding 1000:1 ensures highly efficient polarization separation while maintaining minimal optical losses.

Designed for high-power and precision laser systems, the optic features λ/10 surface flatness over a 9 mm area to preserve beam quality in demanding optical assemblies. Its excellent optical durability and low absorption make it an ideal choice for industrial, scientific, and research environments where stable polarization control is critical.

PP-UVFS-25.4-6.35-TFP86 High-Power 1064 nm Thin-Film Polarizer,

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Specifications

Substrate Material: UV-Grade Fused Silica (UVFS)
Shape: Rectangle
Size (largest Dimension): 25.4 mm
Thickness: 6.35 mm
Clear Aperture (CA): 87 %
Angle Of Incidence (AOI): 45 – 45 deg
Wavelength Range: 1064 – 1064 nm
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Extinction Ratio @ AOI And Peak Wavelength (Tp/Ts): >= 1000:1
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-TFP86
FindLight SKU: FL-24684

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-TFP86
  • Designed for 1064 nm Nd:YAG and fiber laser systems
  • UV fused silica substrate for excellent thermal and optical stability
  • Diameter: 25.4 mm (1 inch)
  • Thickness: 6.35 mm
  • Optimized for 45° angle of incidence
  • Rs >99.9% at 1064 nm
  • Tp >98% at 1064 nm
  • Extinction Ratio (Tp/Ts): >1000:1
  • Surface flatness: <λ/10 over 9 mm area
  • Ion Beam Sputtered (IBS) dielectric coating for superior durabilit
  •  Low absorption and high laser-induced damage threshold suitable for demanding laser applications

Applications

  • Nd:YAG laser systems
  • High-power fiber laser beam delivery
  • Laser polarization management
  • Polarization beam splitting
  • Laser materials processing
  • Scientific optical experiments
  • Industrial laser manufacturing
  • Optical instrumentation
  • Laser beam routing and conditioning
  • Research laboratories using high-energy laser sources

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.9000
Estimated US Tariff: 10%

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Frequently Asked Questions

What is the operating wavelength of the PP-UVFS-25.4-6.35-TFP86?
This thin-film polarizer is optimized for operation at 1064 nm, making it suitable for Nd:YAG and many high-power fiber laser systems.
What polarization performance does this optic provide?
The optic reflects more than 99.9% of s-polarized light while transmitting more than 98% of p-polarized light at a 45° angle of incidence, with an extinction ratio greater than 1000:1.
Why is UV fused silica used as the substrate?
UV fused silica offers excellent transmission, low thermal expansion, high resistance to laser damage, and outstanding optical stability, making it ideal for precision and high-power laser applications.
Can this polarizer be used with high-power lasers?
Yes. The IBS dielectric coating provides extremely low absorption, excellent environmental durability, and a high laser-induced damage threshold, making the optic well suited for demanding high-power laser systems.
What types of systems commonly use this thin-film polarizer?
The PP-UVFS-25.4-6.35-TFP86 is commonly integrated into laser beam steering assemblies, polarization beam splitters, scientific instruments, industrial laser equipment, optical laboratories, and precision photonics systems requiring efficient polarization control.

Got more questions? Use the inquiry form to ask the supplier directly.

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