Thumbnail of PP-UVFS-25.4-3.0-TFP4514 High-Damage Thin-Film Polarizer 795-805 nm photo 1
Thumbnail of PP-UVFS-25.4-3.0-TFP4514 High-Damage Thin-Film Polarizer 795-805 nm photo 2

Description

The OPTOMAN PP-UVFS-25.4-3.0-TFP4514 is a high-performance thin-film polarizer designed for ultrafast and high-power laser systems operating around 800 nm (795–805 nm). Manufactured on a premium UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this optic delivers outstanding polarization separation with exceptionally high transmission for p-polarized light and high reflection for s-polarized light while maintaining minimal absorption and excellent laser damage resistance.

Optimized for 45° angle of incidence, this precision optical component is ideal for femtosecond Ti:Sapphire lasers, ultrafast research laboratories, nonlinear optics experiments, and laser beam routing systems where stable polarization control is essential. Its robust dielectric coating ensures long-term reliability in demanding scientific and industrial environments.

PP-UVFS-25.4-3.0-TFP4514 High-Damage Thin-Film Polarizer 795-805 nm

Visit the Optoman Store

Specifications

Substrate Material: UV-Grade Fused Silica (UVFS)
Shape: Round
Size (largest Dimension): 25.4 mm
Thickness: 3 mm
Clear Aperture (CA): 85 %
Angle Of Incidence (AOI): 45 – 45 deg
Wavelength Range: 795 – 805 nm
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): 10-5
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/10
Extinction Ratio @ AOI And Peak Wavelength (Tp/Ts): >= 1000:1
Manufacturer Part Number (MPN): PP-UVFS-25.4-3.0-TFP4514
FindLight SKU: FL-24688

Got questions about specs? Use the inquiry form to ask.

Document icon Download Data Sheet Download icon

Features

  • Manufacturer Part Number: PP-UVFS-25.4-3.0-TFP4514
  • Designed for 795–805 nm wavelength range (800 nm center wavelength)
  • Optimized for 45° angle of incidence
  • High reflection for s-polarized light (>99.8%)
  • High transmission for p-polarized light (>98%)
  • Ion Beam Sputtered (IBS) dielectric coating for excellent durability and coating stability
  • UV fused silica substrate suitable for ultrafast and high-power laser applications
  • 25.4 mm diameter with 3 mm thickness
  • Approximately λ/8 transmitted wavefront flatness over an 8 mm area
  • Low absorption and excellent laser-induced damage threshold for demanding laser systems

Applications

  • Ti:Sapphire femtosecond laser systems
  • Ultrafast spectroscopy
  • High-power laser beam routing
  • Polarization management in scientific instruments
  • Optical amplifier systems
  • Nonlinear frequency conversion experiments
  • Pump-probe measurement setups
  • Laser research laboratories
  • Precision optical test benches

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.9000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the operating wavelength of the PP-UVFS-25.4-3.0-TFP4514?
The polarizer is optimized for operation between 795 nm and 805 nm, making it ideal for Ti:Sapphire laser systems centered at 800 nm.
What polarization performance does this optic provide?
The optic reflects more than 99.8% of s-polarized light while transmitting more than 98% of p-polarized light, providing efficient polarization separation for demanding optical systems.
Why is Ion Beam Sputtering (IBS) beneficial?
IBS coatings produce dense, highly stable dielectric films with low optical losses, excellent environmental durability, and high laser damage resistance, making them well suited for ultrafast and high-energy laser applications.
Can this polarizer be used with femtosecond lasers?
Yes. The component is specifically intended for ultrafast laser applications, including femtosecond Ti:Sapphire systems where precise polarization control and low optical losses are essential.
Which applications benefit most from this thin-film polarizer?
The polarizer is commonly used in ultrafast spectroscopy, laser beam steering, nonlinear optics, optical research, polarization control modules, and high-power scientific laser systems where efficient beam separation and long-term stability are required.

Got more questions? Use the inquiry form to ask the supplier directly.

Similar Products

Add to Cart