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Description

The OPTOMAN PP-UVFS-50.8-8.0-TFP4526 is a premium high-power thin-film polarizer engineered for demanding ultrafast laser applications operating at 1030 nm. Manufactured on a precision UV fused silica substrate using advanced Ion Beam Sputtering (IBS) coating technology, this optic delivers outstanding polarization separation with Rs >99.9% reflectance and Tp >98% transmission at a 45° angle of incidence, while maintaining exceptionally low optical losses and high laser-induced damage resistance.

Designed for femtosecond and picosecond Yb-based laser systems, the PP-UVFS-50.8-8.0-TFP4526 preserves beam quality, minimizes thermal effects, and supports stable long-term operation in high-average-power environments. Its large 50.8 mm diameter, excellent surface quality, and precision optical specifications make it an excellent choice for laser beam routing, attenuation, pulse management, and polarization control in industrial, scientific, and research applications.

PP-UVFS-50.8-8.0-TFP4526 High-Power 1030 nm Thin-Film Polarizer

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Specifications

Substrate Material: UV-Grade Fused Silica (UVFS)
Shape: Round
Size (largest Dimension): 50.8 mm
Thickness: 8 mm
Clear Aperture (CA): 90 %
Angle Of Incidence (AOI): 45 – 45 deg
Wavelength Range: 1030 – 1030 nm
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/8
Extinction Ratio @ AOI And Peak Wavelength (Tp/Ts): Unspecified
Manufacturer Part Number (MPN): PP-UVFS-50.8-8.0-TFP4526
FindLight SKU: FL-24692

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-50.8-8.0-TFP4526
  • Optimized for 1030 nm Yb-based ultrafast laser systems
  • Precision 45° angle of incidence polarization splitting
  • High-performance IBS dielectric coatings for exceptional durability
  • Rs >99.9% reflectance and Tp >98% transmission at 1030 nm
  • Rear-surface anti-reflection coating with ARp <0.1%
  • High laser-induced damage threshold suitable for femtosecond and picosecond lasers
  • UV fused silica (Corning 7980 0F) substrate for excellent optical stability
  • Large 50.8 mm diameter with 8.0 mm thickness
  • Surface flatness better than λ/8 @ 633 nm
  • Surface quality 20-10 scratch-dig
  • Clear aperture greater than 90%
  • Ideal for high-power, high-energy, and precision laser systems

Applications

  • Yb:YAG ultrafast laser systems
  • Femtosecond laser beam delivery
  • Picosecond laser processing
  • Laser micromachining equipment
  • Polarization-based power control
  • Beam attenuation systems using half-wave plates
  • Pulse picking architectures
  • Polarization cleanup before nonlinear optics
  • Scientific laser laboratories
  • Optical metrology and precision photonics research

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.9000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the PP-UVFS-50.8-8.0-TFP4526 designed for?
This thin-film polarizer is designed to efficiently separate s- and p-polarized light in high-power ultrafast laser systems operating at 1030 nm. It is particularly suited for Yb-based femtosecond and picosecond lasers requiring excellent polarization purity and high optical durability.
Why is Ion Beam Sputtering (IBS) coating important?
IBS coatings produce dense, low-defect dielectric layers with excellent environmental stability, extremely low absorption, and superior laser damage resistance. These characteristics make the optic ideal for high-average-power and high-peak-power laser applications.
Can this polarizer be used with high-energy ultrafast lasers?
Yes. The optic is specifically engineered for demanding ultrafast laser environments and features a high laser-induced damage threshold, making it suitable for many industrial and research laser platforms operating at 1030 nm.
What laser systems commonly use this wavelength?
The 1030 nm wavelength is widely used in Yb:YAG and Yb-doped ultrafast laser platforms for precision micromachining, nonlinear optics, biomedical research, semiconductor manufacturing, and advanced scientific experiments.
What advantages does the 50.8 mm aperture provide?
The larger 50.8 mm optic accommodates expanded laser beams and high-power beam paths while helping preserve beam quality, making it well suited for industrial laser workstations, optical research systems, and custom beam delivery assemblies.

Got more questions? Use the inquiry form to ask the supplier directly.

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