Thumbnail of PP-UVFS-25.4-3.0-TFP4526 High Power 1030 nm Thin-Film Polarizer Ø25.4 mm UV Fused Silica photo 1
Thumbnail of PP-UVFS-25.4-3.0-TFP4526 High Power 1030 nm Thin-Film Polarizer Ø25.4 mm UV Fused Silica photo 2

Description

The OPTOMAN PP-UVFS-25.4-3.0-TFP4526 is a premium ion beam sputtered (IBS) thin-film polarizer engineered for demanding ultrafast and high-power laser applications operating at 1030 nm. Manufactured on high-quality Corning 7980 UV fused silica, this optical component delivers exceptional polarization separation with >99.9% s-polarized reflectance and >98% p-polarized transmission at a 45° angle of incidence, while maintaining excellent beam quality and minimal optical losses.

Designed for femtosecond and picosecond Yb-based laser systems, the polarizer combines high laser-induced damage threshold (LIDT), low absorption IBS coatings, λ/8 surface flatness, and outstanding optical quality for reliable long-term operation in industrial, scientific, and OEM laser platforms. It is an excellent choice for polarization management, beam attenuation, pulse control, and precision laser processing where stability and efficiency are essential.

PP-UVFS-25.4-3.0-TFP4526 High Power 1030 nm Thin-Film Polarizer Ø25.4 mm UV Fused Silica

Visit the Optoman Store

Specifications

Substrate Material: UV-Grade Fused Silica (UVFS)
Shape: Round
Size (largest Dimension): 25.4 mm
Thickness: 3 mm
Clear Aperture (CA): 90 %
Angle Of Incidence (AOI): 45 – 45 deg
Wavelength Range: 1030 – 1030 nm
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/8
Extinction Ratio @ AOI And Peak Wavelength (Tp/Ts): Unspecified
Manufacturer Part Number (MPN): PP-UVFS-25.4-3.0-TFP4526
FindLight SKU: FL-24681

Got questions about specs? Use the inquiry form to ask.

Document icon Download Data Sheet Download icon

Features

  • Manufacturer Part Number: PP-UVFS-25.4-3.0-TFP4526
  • Optimized for 1030 nm Yb-doped ultrafast laser systems
  • High-performance IBS dielectric coating for superior durability and optical stability
  • Rs >99.9% and Tp >98% at 1030 nm, 45° AOI
  • Anti-reflection coating on the exit surface with ARp <0.1%
  • High laser damage threshold for femtosecond and picosecond laser operation
  • UV-grade Corning 7980 fused silica substrate
  • 25.4 mm diameter with 3.0 mm thickness
  • Surface flatness better than λ/8 @ 633 nm
  • Surface quality 20-10 Scratch-Dig
  • Clear aperture greater than 90%
  • Excellent polarization purity while preserving beam quality
  • Ideal for continuous industrial and scientific laser operation

Applications

  • Polarization control in Yb:fiber and Yb:YAG laser systems
  • Femtosecond and picosecond laser beam delivery
  • High-power laser beam attenuation using half-wave plates
  • Pulse energy control and pulse picking systems
  • Laser micromachining and precision material processing
  • Nonlinear optics experiments
  • Optical beam steering and polarization cleanup
  • Ultrafast laser research laboratories
  • Industrial laser manufacturing equipment
  • Scientific spectroscopy and photonics instrumentation

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.9000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the PP-UVFS-25.4-3.0-TFP4526 designed for?
This thin-film polarizer is designed to efficiently separate s- and p-polarized light in high-power and ultrafast 1030 nm laser systems, making it suitable for beam management, attenuation, and polarization control.
Why are IBS coatings beneficial in this polarizer?
Ion Beam Sputtering produces dense, durable dielectric coatings with extremely low absorption, excellent environmental stability, high laser damage resistance, and consistent optical performance over long operating periods.
Which laser systems commonly use this polarizer?
The component is well suited for Yb-based ultrafast laser platforms used in industrial processing and research, including systems operating around 1030 nm for micromachining, nonlinear optics, and precision manufacturing.
Can this polarizer be used with femtosecond lasers?
Yes. It has been specifically optimized for femtosecond and picosecond laser applications, combining high transmission, excellent polarization separation, and a high laser-induced damage threshold for ultrafast pulses.
What optical characteristics help preserve beam quality?
The combination of λ/8 surface flatness, 20-10 scratch-dig surface quality, low-loss IBS coatings, and high-quality UV fused silica substrate minimizes wavefront distortion and scattering, helping maintain excellent beam quality throughout demanding laser applications.

Got more questions? Use the inquiry form to ask the supplier directly.

Similar Products

Add to Cart