Description

The OPTOMAN PP-UVFS-20.0x15.0-6.0-TFP451 is a high-performance rectangular thin film polarizer designed for 1064 nm laser applications requiring precise polarization control and high optical durability. Manufactured using UV fused silica substrate and optimized thin film coatings, this polarizer provides low p-polarization reflection, excellent s-polarization rejection, and reliable performance in high-power laser systems.

Featuring a 20 mm × 15 mm rectangular aperture size, 6 mm thickness, 45° angle of incidence, and high surface quality of 20-10 scratch-dig, the PP-UVFS-20.0x15.0-6.0-TFP451 is engineered for demanding applications including Nd:YAG laser systems, polarization separation, beam splitting, and precision optical assemblies. Its UV fused silica construction offers excellent thermal stability and resistance to laser-induced damage, making it suitable for advanced photonics and industrial laser environments.

PP-UVFS-20.0x15.0-6.0-TFP451 1064nm High Power Thin Film Polarizer

Specifications

Substrate Material: UV-Grade Fused Silica (UVFS)
Shape: Rectangle
Size (largest Dimension): 20 mm
Thickness: 6 mm
Clear Aperture (CA): 50 %
Angle Of Incidence (AOI): 45 – 45 deg
Wavelength Range: 1064 – 1064 nm
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/8
Extinction Ratio @ AOI And Peak Wavelength (Tp/Ts): Unspecified
Manufacturer Part Number (MPN): PP-UVFS-20.0x15.0-6.0-TFP451
FindLight SKU: FL-24682

Got questions about specs? Use the inquiry form to ask.

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Features

  • High Power 1064 nm Thin Film Polarizer Design
  • UV Fused Silica Substrate for Superior Thermal Stability
  • Rectangular 20 mm × 15 mm Optical Format
  • 6 mm Thickness with Tight Mechanical Tolerances
  • 45° Angle of Incidence Optimization
  • Low P-Polarization Reflection: Rp <2% at 1064 nm
  • Low S-Polarization Transmission: Ts <0.2% at 1064 nm
  • High Laser Damage Threshold: >5 J/cm² at 1064 nm, 12 ns, 100 Hz
  • 20-10 Scratch-Dig Surface Quality and λ/8 Surface Flatness
  • Ion Beam Sputtered Optical Coatings for High Reliability

Applications

  • Nd:YAG and 1064 nm Laser Systems
  • Polarization Beam Separation and Beam Splitting
  • High-Power Laser Optical Assemblies
  • Laser Amplification and Pulse Energy Control
  • Research and Development Photonics Systems
  • Industrial Laser Processing Equipment
  • Optical Measurement and Polarization Control Systems
  • Ultrafast and Precision Laser Applications

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.9000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the OPTOMAN PP-UVFS-20.0x15.0-6.0-TFP451 designed for?
The PP-UVFS-20.0x15.0-6.0-TFP451 is optimized for 1064 nm laser applications and is commonly used with Nd:YAG laser systems and other infrared photonics platforms.
What type of optical component is the PP-UVFS-20.0x15.0-6.0-TFP451?
It is a rectangular thin film polarizer designed to control laser polarization by transmitting one polarization state while suppressing the other through specialized dielectric coatings.
What material is used for this OPTOMAN polarizer?
The polarizer uses UV fused silica as the substrate material, providing excellent optical transmission, low thermal expansion, and high resistance to laser damage.
What is the damage threshold of this 1064 nm thin film polarizer?
The polarizer supports a p-polarized laser damage threshold greater than 5 J/cm² at 1064 nm with 12 ns pulse duration and 100 Hz repetition rate.
Can the PP-UVFS-20.0x15.0-6.0-TFP451 be used in high-power laser systems?
Yes. Its UV fused silica substrate, ion beam sputtered coatings, and high damage threshold make it suitable for demanding high-power laser and precision polarization applications.

Got more questions? Use the inquiry form to ask the supplier directly.

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