Description
The OPTOMAN PCV-R300-UVFS-50.8-ET9.52-UBBHR38 is a premium plano-concave spherical mirror engineered for demanding laser and photonics applications operating around the 1030 nm wavelength. Manufactured from UV-grade fused silica and coated using advanced Ion Beam Sputtering (IBS) technology, this optical mirror delivers greater than 99.9% reflectivity across the 925–1170 nm spectral range while providing exceptional durability, low optical losses, and outstanding resistance to high laser power.
With a 50.8 mm diameter, 9.52 mm edge thickness, and a -300 mm radius of curvature, this precision mirror is optimized for beam focusing, multipass cell configurations, spectroscopy, and industrial or scientific laser systems. Its λ/10 surface irregularity and excellent optical quality help preserve beam quality while minimizing wavefront distortion, making it suitable for ultrafast and high-power laser environments.
PCV-R300-UVFS-50.8-ET9.52-UBBHR38 Plano-Concave UV Fused Silica Spherical Mirror
Specifications
| Substrate Material: | UVFS |
|---|---|
| Diameter: | 50.8 mm |
| Edge Thickness: | 9.52 mm |
| S1 Surface: | Concave |
| S2 Surface: | Flat |
| Radius Of Curvature, S1: | -300 mm |
| Radius Of Curvature, S2: | Not Specified |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Unspecified |
| Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): | <= Lambda/10 |
| Max Centration Error: | 3 arcmin |
| Reflectance (@ Peak Wavelength Range, @ AOI): | 99.9 % |
| GDD R: | 50 fs^2 |
| Manufacturer Part Number (MPN): | PCV-R300-UVFS-50.8-ET9.52-UBBHR38 |
| FindLight SKU: | FL-24598 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PCV-R300-UVFS-50.8-ET9.52-UBBHR38
- Plano-concave spherical mirror with -300 mm radius of curvature
- UV fused silica substrate offering excellent thermal and optical stability
- IBS high-reflective coating with >99.9% reflectivity from 925–1170 nm
- Optimized for 1030 nm laser systems
- 50.8 mm diameter with 9.52 mm edge thickness
- Designed for 0° angle of incidence
- Surface irregularity better than λ/10 over the clear aperture for excellent wavefront preservation
- Low absorption and scattering for demanding high-power laser applications
- Suitable for industrial, scientific, spectroscopy, and multipass optical systems
Applications
- Multipass absorption cells
- High-power fiber laser systems
- Ultrafast laser beam delivery
- Beam focusing and beam shaping
- Spectroscopy instrumentation
- Scientific optical experiments
- Precision metrology systems
- Industrial laser processing
- Research laboratories
- OEM photonics equipment integration
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What type of mirror is the PCV-R300-UVFS-50.8-ET9.52-UBBHR38?
What wavelength range is this mirror optimized for?
Why is UV fused silica used as the substrate?
Can this mirror be used with high-power or ultrafast lasers?
Which applications benefit most from this spherical mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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