Description

The OPTOMAN PCV-R800-UVFS-25.4-ET6.35-LLM188 is a premium IBS-coated concave laser mirror engineered for demanding ultrafast laser applications operating at 515 nm. Featuring a -800 mm radius of curvature, UV fused silica substrate, and >99.9% reflectivity, this mirror delivers exceptional beam control with minimal absorption, extremely low scatter, and outstanding long-term stability.

Manufactured using advanced Ion Beam Sputtering (IBS) technology, the mirror offers a high laser-induced damage threshold (LIDT), making it well suited for high-power picosecond and femtosecond laser systems. Its precision optical surface, λ/8 surface irregularity, and 20-10 scratch-dig quality ensure excellent wavefront preservation for scientific, industrial, and precision micromachining applications. Designed for second-harmonic (515 nm) Yb:YAG laser platforms, this mirror provides reliable performance even under continuous high-energy operation.

PCV-R800-UVFS-25.4-ET6.35-LLM188 Ultrafast 515 nm Concave Laser Mirror

Specifications

Substrate Material: UVFS
Diameter: 25.4 mm
Edge Thickness: 6.35 mm
S1 Surface: Concave
S2 Surface: Flat
Radius Of Curvature, S1: -800 mm
Radius Of Curvature, S2: Not Specified
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Unspecified
Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): <= Lambda/8
Max Centration Error: 3 arcmin
Reflectance (@ Peak Wavelength Range, @ AOI): 99.9 %
GDD R: Not Specified
Manufacturer Part Number (MPN): PCV-R800-UVFS-25.4-ET6.35-LLM188
FindLight SKU: FL-24616

Got questions about specs? Use the inquiry form to ask.

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Features

  • IBS dielectric coating with >99.9% reflectivity at 515 nm (0° AOI)
  • Concave optical surface with -800 mm radius of curvature
  • UV fused silica (Corning 7980 0F) substrate for excellent thermal and optical stability
  • 25.4 mm diameter with 6.35 mm edge thickness
  • High laser-induced damage threshold for ultrafast laser systems
  • λ/8 surface irregularity at 633 nm over the clear aperture
  • 20-10 scratch-dig surface quality for minimal scattering
  • Clear aperture of at least 20 mm
  • Low absorption coating optimized for long service life
  • Ideal for high-power picosecond and femtosecond laser operation
  • Suitable for second-harmonic (515 nm) Yb:YAG laser sources
  • Manufactured using advanced Ion Beam Sputtering technology for superior coating durability

Applications

  • Ultrafast laser micromachining
  • Precision laser materials processing
  • Semiconductor manufacturing
  • Scientific laser laboratories
  • Nonlinear optics research
  • Second-harmonic Yb:YAG laser systems
  • High-power femtosecond laser beam delivery
  • Picosecond laser beam steering
  • Optical beam shaping and focusing systems
  • Industrial laser processing equipment

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is this mirror optimized for?
This mirror is optimized for operation at 515 nm and provides greater than 99.9% reflectivity at normal incidence, making it ideal for frequency-doubled Yb:YAG laser systems.
What laser systems is this mirror compatible with?
The mirror is suitable for many industrial and scientific ultrafast laser platforms operating at 515 nm, including second-harmonic Yb:YAG systems from manufacturers such as Light Conversion, Coherent, TRUMPF, Spectra-Physics, Amplitude, EKSPLA, Thorlabs, Fluence, and Photonics Industries.
Why is IBS coating beneficial for ultrafast lasers?
Ion Beam Sputtering produces dense, low-loss dielectric coatings with excellent environmental stability, high reflectivity, low absorption, and superior resistance to laser-induced damage, helping maximize component lifetime in demanding laser environments.
What are the key optical specifications of this mirror?
The mirror features a 25.4 mm diameter, -800 mm radius of curvature, UV fused silica substrate, λ/8 surface irregularity, 20-10 scratch-dig quality, and a minimum 20 mm clear aperture, providing high optical precision for beam control.
Which applications benefit most from this mirror?
This mirror is ideal for ultrafast laser machining, precision manufacturing, scientific research, nonlinear optics experiments, semiconductor processing, and other applications requiring high reflectivity, excellent wavefront quality, and long operational lifetime under high-power 515 nm laser irradiation.

Got more questions? Use the inquiry form to ask the supplier directly.

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