Description
The OPTOMAN PCV-R1000-UVFS-50.8-ET9.52-LLM253 is a premium ion beam sputtered (IBS) plano-concave laser mirror engineered for ultrafast laser systems operating at 515 nm. Manufactured from high-quality UV fused silica (JGS1), this precision optical component combines exceptional surface accuracy, high laser-induced damage threshold (LIDT), and reflectivity exceeding 99.9% across the 480–540 nm spectral range.
Featuring a -1000 mm radius of curvature, 50.8 mm diameter, and precision optical polishing, this mirror delivers excellent beam focusing and steering while minimizing optical losses and wavefront distortion. Unlike refractive optics, its reflective design eliminates chromatic aberration, making it ideal for femtosecond and picosecond laser applications where beam quality and pulse integrity are critical.
Designed with advanced IBS dielectric coatings, the mirror offers outstanding environmental stability, extremely low absorption, and long operational lifetime in demanding industrial, scientific, and research environments.
PCV-R1000-UVFS-50.8-ET9.52-LLM253 Ultrafast 515 nm Concave Laser Mirror
Specifications
| Substrate Material: | UVFS |
|---|---|
| Diameter: | 50.8 mm |
| Edge Thickness: | 9.52 mm |
| S1 Surface: | Concave |
| S2 Surface: | Flat |
| Radius Of Curvature, S1: | -1000 mm |
| Radius Of Curvature, S2: | Not Specified |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | 80-50 |
| Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): | <= Lambda/10 |
| Max Centration Error: | 3 arcmin |
| Reflectance (@ Peak Wavelength Range, @ AOI): | 99.9 % |
| GDD R: | 0 fs^2 |
| Manufacturer Part Number (MPN): | PCV-R1000-UVFS-50.8-ET9.52-LLM253 |
| FindLight SKU: | FL-24603 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PCV-R1000-UVFS-50.8-ET9.52-LLM253
- Optimized for ultrafast lasers operating at 515 nm
- High-reflectivity IBS coating with R >99.9% from 480–540 nm
- UV fused silica (JGS1) substrate provides excellent thermal and optical stability
- Plano-concave geometry with -1000 mm radius of curvature
- 50.8 mm diameter with minimum 41 mm clear aperture
- Surface quality: 20-10 scratch-dig on the coated surface
- Surface irregularity better than λ/10 at 633 nm
- Low group delay dispersion (approximately 0 fs² across the operating band)
- High laser-induced damage threshold suitable for high-power ultrafast laser systems
- Precision laser-engraved orientation marks simplify installation
Applications
- Frequency-doubled Yb:YAG femtosecond laser systems
- Ultrafast laser beam focusing and steering
- Precision laser micromachining
- Scientific spectroscopy setups
- Nonlinear optics experiments
- Optical imaging and beam delivery systems
- Semiconductor and electronics processing
- Biomedical laser instrumentation
- Research laboratories and photonics development
- OEM ultrafast laser integration
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is this mirror designed for?
Why is an IBS coating beneficial?
What does the -1000 mm radius of curvature mean?
Can this mirror be used with femtosecond lasers?
Which laser systems is this mirror compatible with?
Got more questions? Use the inquiry form to ask the supplier directly.
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