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Description

The OPTOMAN PCV-R600-UVFS-76.2-ET12.7-BBHR38 is a premium plano-concave laser mirror engineered for demanding ultrafast and high-power laser systems operating across the 900–1200 nm spectral range. Manufactured from high-quality UV fused silica (JGS1) and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers greater than 99.9% average reflectivity, exceptionally low absorption, minimal scatter, and outstanding long-term durability. It is specifically optimized for 1030 nm laser applications and multipass cell configurations while maintaining excellent broadband performance.

Featuring a -600 mm radius of curvature, λ/8 surface irregularity, 20-10 scratch-dig surface quality, and low group delay dispersion (|GDD| < 50 fs² between 980–1080 nm), this optical component preserves beam quality and pulse integrity in femtosecond and picosecond laser systems. Its large 76.2 mm aperture makes it well suited for scientific research, industrial laser processing, nonlinear optics, and precision beam delivery applications requiring exceptional optical performance.

PCV-R600-UVFS-76.2-ET12.7-BBHR38 Broadband IBS Plano-Concave Laser Mirror

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Specifications

Substrate Material: UVFS
Diameter: 76.2 mm
Edge Thickness: 12.7 mm
S1 Surface: Concave
S2 Surface: Flat
Radius Of Curvature, S1: -600 mm
Radius Of Curvature, S2: Not Specified
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polish
Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): <= Lambda/8
Max Centration Error: 3 arcmin
Reflectance (@ Peak Wavelength Range, @ AOI): 99.9 %
GDD R: 50 fs^2
Manufacturer Part Number (MPN): PCV-R600-UVFS-76.2-ET12.7-BBHR38
FindLight SKU: FL-24604

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PCV-R600-UVFS-76.2-ET12.7-BBHR38
  • Broadband high-reflectivity coating with >99.9% average reflectance from 900–1200 nm
  • Optimized for 1030 nm ytterbium laser systems
  • Advanced Ion Beam Sputtered (IBS) dielectric coating for low absorption, minimal scattering, and superior coating lifetime
  • Plano-concave geometry with -600 mm radius of curvature for efficient beam focusing and relay optics
  • UV fused silica (JGS1) substrate offering excellent thermal stability and optical homogeneity
  • Low dispersion performance with |GDD| < 50 fs² (980–1080 nm) for ultrafast pulse preservation
  • λ/8 transmitted wavefront irregularity and 20-10 scratch-dig surface quality for high beam quality
  • Large 76.2 mm diameter and 61 mm minimum clear aperture for high-power beam handling
  • Suitable for demanding multipass cell, ultrafast laser, and scientific optical systems requiring high laser-induced damage resistance (LIDT)

Applications

  • Multipass cell (MPC) laser systems
  • Ultrafast femtosecond and picosecond lasers
  • Ytterbium fiber and solid-state laser systems operating near 1030 nm
  • High-power laser beam delivery
  • Beam focusing and beam relay optics
  • Nonlinear optics experiments
  • Optical parametric amplifier (OPA) systems
  • Precision scientific instrumentation
  • Industrial laser material processing
  • Research laboratories requiring low-loss broadband reflective optics

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is this mirror designed for?
The mirror provides broadband high reflectivity across 900–1200 nm, making it suitable for a variety of ultrafast and high-power laser systems, with peak optimization around 1030 nm.
Why is Ion Beam Sputtering (IBS) important for laser mirrors?
IBS coatings create dense, durable dielectric layers with extremely low absorption, high environmental stability, excellent laser damage resistance, and long operational lifetime, making them ideal for demanding photonics applications.
Can this mirror be used with femtosecond lasers?
Yes. Its low group delay dispersion (|GDD| < 50 fs² over 980–1080 nm) helps preserve ultrashort pulse duration, making it an excellent choice for femtosecond and picosecond laser systems.
What does the -600 mm radius of curvature provide?
The plano-concave geometry with a -600 mm ROC enables controlled beam focusing and shaping while maintaining excellent optical performance in multipass cells and beam transport systems.
Is this mirror suitable for high-power industrial laser systems?
Yes. The combination of UV fused silica, IBS coating technology, high reflectivity, low absorption, and precision optical polishing makes this mirror well suited for high-power industrial, scientific, and research laser applications.

Got more questions? Use the inquiry form to ask the supplier directly.

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