Description
The OPTOMAN PCV-R1250-UVFS-12.7-ET6.0-ULLM8 is a high-performance ultrafast plano-concave spherical mirror designed for precise beam shaping and focusing applications in Yb:YAG-based femtosecond and picosecond laser systems. Manufactured with a UV fused silica substrate and an IBS dielectric coating, this spherical mirror provides exceptional reflectivity exceeding 99.9% across the 1010–1050 nm wavelength range while maintaining ultra-low group delay dispersion.
Featuring a -1250 mm radius of curvature, 12.7 mm diameter, and 6 mm edge thickness, this concave mirror enables efficient beam control without introducing chromatic aberration associated with conventional refractive optics. Its low-loss performance, high optical quality, and optimized coating make it suitable for demanding ultrafast laser applications requiring stable reflection, beam relay, and precise optical alignment.
PCV-R1250-UVFS-12.7-ET6.0-ULLM8 Ultrafast Plano-Concave Laser Mirror
Specifications
| Substrate Material: | UVFS |
|---|---|
| Diameter: | 12.7 mm |
| Edge Thickness: | 6 mm |
| S1 Surface: | Concave |
| S2 Surface: | Flat |
| Radius Of Curvature, S1: | -1250 mm |
| Radius Of Curvature, S2: | Not Specified |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Commercial Polish |
| Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): | <= Lambda/4 |
| Max Centration Error: | 3 arcmin |
| Reflectance (@ Peak Wavelength Range, @ AOI): | 99.9 % |
| GDD R: | 15 fs^2 |
| Manufacturer Part Number (MPN): | PCV-R1250-UVFS-12.7-ET6.0-ULLM8 |
| FindLight SKU: | FL-24612 |
Got questions about specs? Use the inquiry form to ask.
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Features
- High reflectivity exceeding 99.9% at 1010–1050 nm for efficient ultrafast laser beam management
- Optimized for 1030 nm Yb:YAG and Yb-doped ultrafast laser systems
- UV fused silica substrate providing excellent thermal stability and low expansion properties
- Ion beam sputtered (IBS) dielectric coating for high durability and low optical absorption
- Group delay dispersion of less than 15 fs² for maintaining femtosecond pulse quality
- Plano-concave spherical design with -1250 mm radius of curvature for beam focusing and shaping applications
- High optical surface quality of 20-10 scratch-dig according to MIL-PRF-13830B standards
- Compact 12.7 mm diameter format suitable for integrated laser systems and optical assemblies
Applications
- Ultrafast femtosecond laser systems
- Yb:YAG laser beam delivery and pulse processing systems
- Laser beam focusing and shaping modules
- Optical relay systems and mode-matching assemblies
- Nonlinear optics and harmonic generation setups
- Precision laser micromachining and material processing systems
- Compact optical heads for industrial and research laser platforms
- Beam expansion, refocusing, and imaging configurations in advanced photonics systems
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the OPTOMAN PCV-R1250-UVFS-12.7-ET6.0-ULLM8 mirror designed for?
What wavelength range is this concave laser mirror optimized for?
What coating technology is used on the PCV-R1250-UVFS-12.7-ET6.0-ULLM8?
Why is UV fused silica used as the substrate material?
Can this mirror be used with commercial ultrafast laser systems?
Got more questions? Use the inquiry form to ask the supplier directly.
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