Description

The OPTOMAN PCV-R2500-UVFS-25.4-ET6.35-ULLM8 is a precision plano-concave spherical mirror engineered for demanding ultrafast laser applications operating around the 1030 nm wavelength. Manufactured from UV fused silica and coated using advanced Ion Beam Sputtering (IBS) technology, it delivers greater than 99.9% reflectivity across 1010–1050 nm while maintaining exceptionally low optical losses, excellent surface accuracy, and outstanding long-term durability.

Featuring a 25.4 mm diameter, a -2500 mm radius of curvature, and λ/10 surface irregularity over the clear aperture, this mirror provides precise beam focusing and relay performance without introducing chromatic aberration. Its robust dielectric coating offers high laser damage resistance, making it an excellent choice for high-power femtosecond and picosecond laser systems used in industrial processing, scientific research, and advanced photonics laboratories.

PCV-R2500-UVFS-25.4-ET6.35-ULLM8 Ultrafast IBS Concave Spherical Mirror

Specifications

Substrate Material: UVFS
Diameter: 25.4 mm
Edge Thickness: 6.35 mm
S1 Surface: Concave
S2 Surface: Flat
Radius Of Curvature, S1: -2500 mm
Radius Of Curvature, S2: Not Specified
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 40-20
Surface Quality, S2 (scratch-dig): Commercial Polish
Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): <= Lambda/10
Max Centration Error: 3 arcmin
Reflectance (@ Peak Wavelength Range, @ AOI): 99.9 %
GDD R: 15 fs^2
Manufacturer Part Number (MPN): PCV-R2500-UVFS-25.4-ET6.35-ULLM8
FindLight SKU: FL-24585

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PCV-R2500-UVFS-25.4-ET6.35-ULLM8
  • Precision plano-concave spherical mirror with -2500 mm radius of curvature
  • UV fused silica substrate for excellent thermal and optical stability
  • IBS dielectric coating with >99.9% reflectivity from 1010–1050 nm
  • Optimized for 1030 nm Yb:YAG and Yb-doped ultrafast laser systems
  • λ/10 surface irregularity over the clear aperture for superior wavefront quality
  • 40-20 scratch-dig surface quality with polished rear surface
  • 25.4 mm diameter with 6.35 mm edge thickness for easy integration into standard optomechanical mounts
  • Low scatter and low absorption coating suitable for high average and high peak power lasers
  • Laser-engraved orientation mark and radius of curvature identification for convenient installation

Applications

  • Ultrafast femtosecond and picosecond laser systems
  • Yb:YAG and Yb-fiber laser beam delivery
  • Beam focusing and relay optics
  • Optical beam shaping systems
  • Precision laser material processing
  • Nonlinear optics and frequency conversion setups
  • Scientific spectroscopy and laboratory research
  • Optical imaging and measurement instruments
  • High-power industrial laser platforms
  • OEM photonics equipment integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary use of the PCV-R2500-UVFS-25.4-ET6.35-ULLM8 mirror?
This mirror is designed for beam focusing, relay imaging, and beam shaping in ultrafast laser systems operating near 1030 nm. Its concave geometry enables precise optical control while preserving beam quality.
Why is an IBS coating beneficial for laser mirrors?
Ion Beam Sputtering produces dense, durable dielectric coatings with extremely high reflectivity, minimal absorption, low scatter, and excellent resistance to high laser power, resulting in reliable long-term optical performance.
Can this mirror be used with high-power femtosecond lasers?
Yes. The mirror is specifically developed for ultrafast laser applications and features a high-damage-threshold dielectric coating suitable for demanding femtosecond and picosecond laser environments.
Why choose a concave mirror instead of a focusing lens?
A concave mirror focuses light through reflection rather than refraction, eliminating chromatic aberration. This makes it ideal for broadband ultrafast laser pulses where preserving pulse quality is essential.
Which laser systems are compatible with this mirror?
The mirror is optimized for Yb-based laser sources operating around 1030 nm and is suitable for many industrial and research laser platforms used in micromachining, spectroscopy, nonlinear optics, and precision photonics applications.

Got more questions? Use the inquiry form to ask the supplier directly.

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