Description
The OPTOMAN PCV-R200-UVFS-25.4-ET6.35-ULLM8 is a precision plano-concave ultrafast laser mirror engineered for demanding femtosecond and picosecond laser applications operating around 1030 nm. Manufactured from UV fused silica and coated using advanced Ion Beam Sputtering (IBS) technology, it delivers greater than 99.9% reflectivity across the 1010–1050 nm wavelength range while maintaining exceptionally low group delay dispersion (|GDD| <15 fs²) to preserve ultrashort pulse quality.
Featuring a -200 mm radius of curvature, this mirror provides accurate beam focusing and relay without introducing chromatic aberration, making it an excellent choice for Yb:YAG and Yb-fiber laser systems. High surface quality, excellent wavefront accuracy, and low scattering ensure reliable performance in scientific research, industrial micromachining, nonlinear optics, and precision beam delivery systems.
PCV-R200-UVFS-25.4-ET6.35-ULLM8 Plano-Concave Ultrafast Laser Mirror,
Specifications
| Substrate Material: | UVFS |
|---|---|
| Diameter: | 25.4 mm |
| Edge Thickness: | 6.35 mm |
| S1 Surface: | Concave |
| S2 Surface: | Flat |
| Radius Of Curvature, S1: | -200 mm |
| Radius Of Curvature, S2: | Not Specified |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 40-20 |
| Surface Quality, S2 (scratch-dig): | Commercial Polish |
| Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): | <= Lambda/10 |
| Max Centration Error: | 3 arcmin |
| Reflectance (@ Peak Wavelength Range, @ AOI): | 99.9 % |
| GDD R: | 15 fs^2 |
| Manufacturer Part Number (MPN): | PCV-R200-UVFS-25.4-ET6.35-ULLM8 |
| FindLight SKU: | FL-24586 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PCV-R200-UVFS-25.4-ET6.35-ULLM8
- Plano-concave UV fused silica mirror with -200 mm radius of curvature
- High-reflectivity IBS coating providing >99.9% reflectance from 1010–1050 nm
- Optimized for 1030 nm Yb-based ultrafast laser systems
- Ultra-low group delay dispersion (|GDD| <15 fs²) for excellent pulse preservation
- High laser damage threshold suitable for high peak-power femtosecond and picosecond lasers
- 25.4 mm diameter with 20 mm minimum clear aperture
- Surface irregularity better than λ/10 @ 633 nm across the clear aperture
- Precision 40-20 scratch-dig optical surface with polished rear surface
- Ideal for beam focusing, relay optics, and high-performance optical assemblies
Applications
- Femtosecond and picosecond laser beam delivery
- Yb:YAG and Yb-fiber laser systems
- Ultrafast laser material processing
- Precision beam focusing and beam shaping
- Mode-matching optics
- Optical relay and imaging systems
- Nonlinear optics experiments
- Multiphoton microscopy
- Scientific laser research laboratories
- Industrial micromachining and laser manufacturing
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What lasers is the PCV-R200-UVFS-25.4-ET6.35-ULLM8 designed for?
Why is low group delay dispersion important?
What advantage does a plano-concave mirror offer over a lens?
Is this mirror suitable for high-power laser applications?
Which applications benefit most from this optical mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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