Description
Designed for demanding ultrafast laser applications, the OPTOMAN PCV-R1500-UVFS-25.4-ET6.35-ULLM8 plano-concave laser mirror combines exceptional optical quality with industry-leading dielectric coating performance. Featuring a -1500 mm radius of curvature and a precision-polished UV fused silica substrate, this mirror is optimized for 1030 nm laser systems and delivers over 99.9% reflectivity across the 1010–1050 nm wavelength range.
The advanced Ion Beam Sputtered (IBS) coating ensures low optical losses, excellent environmental durability, and outstanding resistance to high laser fluence, making the mirror well suited for both laboratory research and industrial photonics. Whether integrated into laser resonators, beam delivery systems, or precision optical assemblies, this component provides stable, repeatable performance and superior wavefront preservation for high-power ultrafast laser applications.
PCV-R1500-UVFS-25.4-ET6.35-ULLM8 Ultrafast Plano-Concave IBS Laser Mirror 1030nm
Specifications
| Substrate Material: | UVFS |
|---|---|
| Diameter: | 25.4 mm |
| Edge Thickness: | 6.35 mm |
| S1 Surface: | Concave |
| S2 Surface: | Flat |
| Radius Of Curvature, S1: | -1500 mm |
| Radius Of Curvature, S2: | Not Specified |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 40-20 |
| Surface Quality, S2 (scratch-dig): | Commercial Polish |
| Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): | <= Lambda/10 |
| Max Centration Error: | 3 arcmin |
| Reflectance (@ Peak Wavelength Range, @ AOI): | 99.9 % |
| GDD R: | 15 fs^2 |
| Manufacturer Part Number (MPN): | PCV-R1500-UVFS-25.4-ET6.35-ULLM8 |
| FindLight SKU: | FL-24591 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PCV-R1500-UVFS-25.4-ET6.35-ULLM8
- Plano-concave geometry with -1500 mm radius of curvature (ROC)
- Optimized for 1030 nm Yb:YAG ultrafast laser applications
- High-reflectivity IBS coating providing >99.9% reflectance from 1010–1050 nm
- UV fused silica substrate for superior thermal and mechanical stability
- 25.4 mm diameter with 6.35 mm edge thickness
- Surface irregularity better than λ/10 over the clear aperture for excellent wavefront preservation
- Designed for 0° angle of incidence
- Low absorption and low scattering for demanding high-power laser systems
- Suitable for continuous industrial use, scientific research, and precision photonics applications
Applications
- Ultrafast femtosecond laser systems
- Yb:YAG laser resonators and oscillators
- Beam focusing and beam shaping
- Laser cavity design
- High-power industrial laser processing
- Scientific spectroscopy and photonics research
- Optical laboratories and laser development
- Precision material processing systems
- Optical beam delivery and alignment
- Advanced laser instrumentation
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What laser wavelength is this mirror designed for?
What does the -1500 mm radius of curvature mean?
Is this mirror suitable for high-power laser applications?
Which applications benefit most from this mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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