Description
The OPTOMAN PCV-R1000-UVFS-25.4-ET6.35-ULLM8 is a premium plano-concave spherical mirror engineered for ultrafast laser applications operating around 1030 nm. Manufactured from high-quality UV fused silica and coated using advanced Ion Beam Sputtering (IBS) technology, it delivers greater than 99.9% reflectivity across the 1010-1050 nm wavelength range while maintaining exceptionally low group delay dispersion (|GDD| <15 fs²).
Featuring a -1000 mm radius of curvature, 25.4 mm diameter, λ/10 surface accuracy, and superior 20-10 scratch-dig surface quality, this mirror provides precise beam focusing and shaping without introducing chromatic aberration. Its high laser-induced damage threshold (LIDT), excellent optical stability, and minimal absorption make it ideal for demanding femtosecond and picosecond laser systems used in industrial processing, nonlinear optics, and scientific research.
PCV-R1000-UVFS-25.4-ET6.35-ULLM8 Ultrafast IBS Plano-Concave Spherical Mirror
Specifications
| Substrate Material: | UVFS |
|---|---|
| Diameter: | 25.4 mm |
| Edge Thickness: | 6.35 mm |
| S1 Surface: | Concave |
| S2 Surface: | Flat |
| Radius Of Curvature, S1: | -1000 mm |
| Radius Of Curvature, S2: | Not Specified |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Commercial Polish |
| Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): | <= Lambda/10 |
| Max Centration Error: | 3 arcmin |
| Reflectance (@ Peak Wavelength Range, @ AOI): | 99.9 % |
| GDD R: | 15 fs^2 |
| Manufacturer Part Number (MPN): | PCV-R1000-UVFS-25.4-ET6.35-ULLM8 |
| FindLight SKU: | FL-24584 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PCV-R1000-UVFS-25.4-ET6.35-ULLM8
- Plano-concave spherical mirror with -1000 mm radius of curvature
- UV fused silica substrate for outstanding thermal and optical stability
- IBS dielectric coating with >99.9% reflectivity from 1010-1050 nm
- Optimized for 1030 nm Yb:YAG ultrafast laser systems
- Extremely low dispersion with |GDD| <15 fs²
- High laser-induced damage threshold for high-power ultrafast lasers
- λ/10 surface irregularity over the clear aperture for excellent wavefront preservation
- Premium 20-10 scratch-dig surface quality for minimal scattering
- 25.4 mm diameter with 20 mm minimum clear aperture● Uncoated flat rear surface for flexible optical integration
Applications
- Beam focusing and relay optics in femtosecond and picosecond laser systems
- Beam shaping and optical beam delivery modules
- Yb:YAG laser processing systems operating at 1030 nm
- Nonlinear frequency conversion and harmonic generation setups
- Precision laser micromachining and materials processing
- Ultrafast spectroscopy and scientific research
- Optical imaging systems requiring zero chromatic aberration
- Industrial laser workstations and optical assemblies
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength range is this mirror optimized for?
Why is IBS coating beneficial for ultrafast laser applications?
What advantage does a plano-concave mirror offer over a lens?
Can this mirror be used with high-power femtosecond lasers?
Which laser systems is this mirror compatible with?
Got more questions? Use the inquiry form to ask the supplier directly.
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