Description
he PP-UVFS-25.4-3.0-AR772-AR772 is a 1-inch UV fused silica optical window engineered for high-performance 266 nm laser applications. It uses C7980 0F KrF-grade UVFS and features an ion beam sputtered anti-reflection coating on both sides, providing reflectance below 0.25% at the specified wavelength.
With a 25.4 mm diameter and 3.0 mm thickness, this precision laser window is designed to maintain excellent beam transmission while limiting optical losses and back reflections. Its 10-5 scratch-dig specification, better-than-λ/10 surface flatness at 633 nm, and parallelism below 3 arcmin make it suitable for precision UV photonics.
The window is particularly appropriate for 266 nm fourth-harmonic Nd:YAG laser systems, UV beam delivery assemblies, laser micromachining equipment, and scientific optical instruments requiring stable and precise ultraviolet transmission.
PP-UVFS-25.4-3.0-AR772-AR772 UVFS Laser Window 25.4mm
Specifications
| Substrate Material: | UV Grade Fused Silica (UVFS)) |
|---|---|
| Design Wavelength 1: | 266 nm |
| Diameter (or Largest Dimension): | 25.4 mm |
| Thickness: | 3 mm |
| Clear Aperture (CA): | 90 % |
| Antireflection Coating: | Coated |
| Surface Quality (Scratch-Dig): | 10-5 |
| Surface Flatness: | <= Lambda/10 |
| Transmitted Wavefront Distortion (TWFD) @ 633nm Or Per Manufacturer: | Unspecified |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-3.0-AR772-AR772 |
| FindLight SKU: | FL-24772 |
Got questions about specs? Use the inquiry form to ask.
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Features
- 266 nm optimized UV optical window
- C7980 0F KrF-grade UV fused silica substrate
- 25.4 mm nominal optical diameter
- 3.0 mm nominal thickness
- IBS anti-reflection coating on both surfaces
- Less than 0.25% reflectance at 266 nm
- 10-5 scratch-dig surface quality
- Surface flatness better than λ/10 at 633 nm
- Clear aperture greater than 90%
- Parallelism below 3 arcmin
- Diameter tolerance of +0/-0.1 mm
- Thickness tolerance of ±0.1 mm
- Protective 0.2–0.4 mm × 45° chamfers
- Designed for precision ultraviolet laser applications
Applications
- 266 nm UV Laser Systems
- Fourth-Harmonic Nd:YAG Laser Systems
- UV Laser Beam Delivery
- UV Beam Conditioning Systems
- Precision Laser Micromachining
- Ultraviolet Material Processing
- Semiconductor Manufacturing
- Microelectronics Processing
- UV Spectroscopy
- Scientific Optical Instruments
- UV Imaging Systems
- Photonics Research Equipment
- Laser Research and Development
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.9000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the PP-UVFS-25.4-3.0-AR772-AR772 used for?
What material is used for this 266 nm laser window?
What is the AR coating specification?
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Got more questions? Use the inquiry form to ask the supplier directly.
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