Description

The OPTOMAN PP-UVFS-25.4-6.35-PRM77 is a precision UV fused silica partial reflector designed for controlled beam extraction in advanced laser systems. This high-performance output coupler features an ion beam sputtered (IBS) coating optimized for 80% partial reflectivity at 532 nm with a 0° angle of incidence, enabling efficient management of laser cavity output and external beam delivery.

Manufactured from high-quality UV fused silica substrate, the optic provides excellent thermal stability, low wavefront distortion, and reliable performance in demanding laser environments. With a 25.4 mm diameter, 6.35 mm thickness, and approximately λ/8 surface flatness over a 15 mm area, the PP-UVFS-25.4-6.35-PRM77 is engineered for applications requiring precise transmission and reflection control at green laser wavelengths.

This OPTOMAN partial reflector is suitable for integration into laser resonators, harmonic generation systems, scientific instruments, and industrial photonics platforms where stable optical performance and durable IBS coatings are required.

PP-UVFS-25.4-6.35-PRM77 532nm UVFS Partial Reflector Output Coupler

Specifications

Substrate Material: UVFS
Diameter: 25.4 mm
Thickness: 6.35 mm
Clear Aperture (CA): 80 %
Peak Wavelength: 532 nm
Optimized AOI: 0 – 0 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Unspecified
Surface Flatness, S1 (@633nm Over CA Or Per Manufacturer): <= Lambda/8
Surface Flatness, S2 (@633nm Over CA Or Per Manufacturer): Unspecified
Parallelism: 10 arcsec
Reflectance, S1 (@ Peak Wavelength, Optimized AOI): 80 %
Reflectance, S2 (AR @ Peak Wavelength, Optimized AOI): 0.1 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-PRM77
FindLight SKU: FL-24569

Got questions about specs? Use the inquiry form to ask.

Document icon Download Data Sheet Download icon

Features

  • High-quality UV fused silica substrate for excellent thermal and optical stabilit
  •  Manufacturer part number: PP-UVFS-25.4-6.35-PRM77
  • Partial reflector coating optimized for PR = 80% ±2% at 532 nm
  • Designed for 0° angle of incidence operation
  • Precision 25.4 mm diameter and 6.35 mm thickness configuration
  • Surface flatness approximately λ/8 over 15 mm area at 633 nm
  • Ion Beam Sputtering (IBS) coating technology for low absorption and long-term durability
  • High laser damage threshold performance for demanding laser applications
  • Provides controlled beam transmission and reflection for output coupling applications

Applications

  • Green laser (532 nm) cavity output coupling
  • Nd:YAG second harmonic generation laser systems
  • Pulsed and high-power laser resonators
  • Scientific research laser platforms
  • Industrial laser processing systems
  • Optical beam management and power control assembliesOEM laser systems requiring stable partial reflection performance

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the OPTOMAN PP-UVFS-25.4-6.35-PRM77 used for?
The OPTOMAN PP-UVFS-25.4-6.35-PRM77 is a partial reflector designed primarily for laser output coupling applications. It controls the amount of 532 nm laser light reflected and transmitted, making it suitable for laser resonators and beam management systems.
What wavelength is this partial reflector optimized for?
This optic is optimized for operation at 532 nm with a partial reflectivity of 80% ±2%, providing controlled optical coupling for green laser systems.
What type of coating does the PP-UVFS-25.4-6.35-PRM77 use?
The optic uses an Ion Beam Sputtered (IBS) coating, a high-performance thin-film coating technology known for low optical absorption, excellent durability, and stable spectral performance.
What material is used for this OPTOMAN partial reflector?
The optic is manufactured using UV fused silica, which offers excellent transmission properties, thermal resistance, and dimensional stability for precision laser applications.
Can this output coupler be used in high-power laser systems?
Yes. The PP-UVFS-25.4-6.35-PRM77 is designed for demanding photonics applications where reliable partial reflection, optical precision, and coating durability are required, including industrial and research laser systems.

Got more questions? Use the inquiry form to ask the supplier directly.

Similar Products

Add to Cart