SOC750 Midwave Infrared Hyperspectral Imager

Specifications

Imaging Mode: Electroluminescence (EL), Raman, Photoluminescence (PL), Diffuse Reflectance (DR)
Excitation Wavelength: Not Available
Spectral Range (Raman Imaging): Custom
Spectral Range (PL, EL, DR Imaging): Custom
Spectral Resolution (Raman Imaging): Custom
Spectral Resolution (PL, EL, DR Imaging): Custom
Spatial Resolution: Nanometer Range
Document icon Download Data Sheet Download icon

Features


  • Portable Design: Developed in collaboration with U.S. Naval Air Systems Command and Surface Optics, the 410-DHR is designed for field use, allowing verification of optical properties of large objects.

  • Multi-Angle Measurements: Measures integrated surface reflectance at two angles of incidence (20° and 60°) for comprehensive data collection.

  • Wide Spectral Range: Covers six discrete wavelength bands from 0.9 to 12 μm, ensuring versatile application across various materials.

  • Quick and Efficient: Fast calibration in one minute and data collection in 10 seconds or less, optimizing time in the field.

  • Immediate Data Access: Features a built-in touchscreen display for easy data review and management.

  • Optional Grazing Angle Model: Available with an 80° incident angle for specialized measurements.

  • High Accuracy and Repeatability: Offers accuracy of +/- 0.03 and repeatability of ±0.005 units.

  • Adaptable Sample Measurement: Capable of measuring flat samples (≥ 0.5 in. diameter) and curved samples (6 in. convex; 12 in. concave).

  • Temperature Range: Operates effectively in ambient temperatures or with samples heated/cooled to 0 - 100º C.

  • Portable Power: Runs for 2 hours on a single battery, with easy replacement for continuous operation.

Applications


  • IR Signature: Analyze and verify the infrared signature of various surfaces.

  • Stealth Coatings / Low Observables: Evaluate coatings designed to reduce detectability.

  • Thermal Modeling: Support thermal analysis and modeling by providing accurate emissivity data.

  • Thermal Camera Calibration: Calibrate thermal cameras using precise emissivity measurements.

  • Emissivity of Wafer Fabrication: Measure and verify the emissivity of wafers during fabrication processes.