Description
The OPTOMAN PCV-R500-UVFS-50.8-ET9.52-UBBHR38 is a high-precision UV fused silica plano-concave spherical mirror engineered for advanced laser and optical systems operating in the 925–1170 nm wavelength range. Featuring a high-reflectivity ion beam sputtered (IBS) coating with reflectance above 99.9%, this mirror provides excellent optical performance for demanding applications requiring efficient beam reflection, stability, and low optical losses.
Designed with a 50.8 mm diameter, -500 mm radius of curvature, and 41 mm clear aperture, the mirror delivers reliable beam shaping and focusing capabilities while maintaining high surface quality and dimensional accuracy. The UV fused silica substrate offers superior thermal stability and low expansion characteristics, making it suitable for precision laser systems, multipass cells, spectroscopy equipment, and other high-performance photonics applications.
PCV-R500-UVFS-50.8-ET9.52-UBBHR38 UVFS Plano-Concave Spherical Laser Mirror
Specifications
| Substrate Material: | UVFS |
|---|---|
| Diameter: | 50.8 mm |
| Edge Thickness: | 9.52 mm |
| S1 Surface: | Concave |
| S2 Surface: | Flat |
| Radius Of Curvature, S1: | -500 mm |
| Radius Of Curvature, S2: | Not Specified |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Unspecified |
| Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): | <= Lambda/10 |
| Max Centration Error: | 3 arcmin |
| Reflectance (@ Peak Wavelength Range, @ AOI): | 99.9 % |
| GDD R: | 50 fs^2 |
| Manufacturer Part Number (MPN): | PCV-R500-UVFS-50.8-ET9.52-UBBHR38 |
| FindLight SKU: | FL-24596 |
Got questions about specs? Use the inquiry form to ask.
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Features
- High-reflectivity IBS coating with reflectance greater than 99.9% from 925–1170 nm for efficient laser beam management.
- UV fused silica substrate provides excellent thermal stability, durability, and optical transmission properties.
- Plano-concave spherical mirror design with -500 mm radius of curvature for precise beam focusing and optical path control.
- 50.8 mm diameter with 41 mm clear aperture for integration into large-aperture optical assemblies.
- Precision surface quality of 20-10 scratch-dig and surface irregularity below λ/10 at 633 nm for high-quality laser performance.
- Low centration error below 3 arcmin for accurate optical alignment.
- Designed for multipass cell (MPC) and advanced laser system configurations
Applications
- Multipass spectroscopy systems
- Ultrafast and high-power laser systems
- Laser beam focusing and shaping assemblies
- Precision optical resonators
- Laser diagnostics and measurement equipment
- Infrared laser systems operating around 1030 nm
- Research and industrial photonics instrumentation
- Scientific optical setups requiring high-reflectivity spherical mirrors
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What type of mirror is the OPTOMAN PCV-R500-UVFS-50.8-ET9.52-UBBHR38?
What wavelength range is this OPTOMAN spherical mirror designed for?
What coating technology is used on the PCV-R500-UVFS-50.8-ET9.52-UBBHR38?
Why is UV fused silica used as the substrate material for this mirror?
What applications commonly use this spherical mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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