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Description

The PCV-R2400-UVFS-25.4-ET6.35-ULLM8SHL is a high-performance 1030 nm plano-concave spherical mirror engineered for demanding ultrafast and high-power laser applications. Featuring a 25.4 mm UV fused silica substrate, 6.35 mm edge thickness, and a -2400 mm radius of curvature, this precision optic is designed to focus, collimate, and redirect laser beams while maintaining outstanding optical performance. The mirror incorporates a premium ion beam sputtered (IBS) dielectric coating that delivers greater than 99.9% reflectivity at 1030 nm at normal incidence, making it ideal for Yb-based laser systems and other high-power infrared laser platforms.

As part of OPTOMAN's SuperHero Power series, this spherical mirror is optimized for applications requiring exceptional coating durability, low optical losses, and long operational lifetime under high average and high peak laser powers. The plano-concave geometry provides precise beam focusing without introducing chromatic aberration, while the UV fused silica substrate offers excellent thermal stability, low absorption, and high resistance to laser-induced damage. The mirror's high surface quality and surface irregularity of better than λ/8 support excellent wavefront preservation in precision optical systems.

Designed for OEM integration, scientific research, and industrial laser processing, the PCV-R2400-UVFS-25.4-ET6.35-ULLM8SHL is well suited for beam delivery, optical resonators, laser focusing assemblies, and advanced photonics systems where reliable optical performance and long-term coating stability are essential.

PCV-R2400-UVFS-25.4-ET6.35-ULLM8SHL 1030 nm Plano-Concave Spherical Mirror

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Specifications

Substrate Material: UVFS
Diameter: 25.4 mm
Edge Thickness: 6.35 mm
S1 Surface: Concave
S2 Surface: Flat
Radius Of Curvature, S1: -2400 mm
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Commercial Polish
Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): <= Lambda/8
Max Centration Error: 3 arcmin
Reflectance (@ Peak Wavelength Range, @ AOI): 99.9 %
Manufacturer Part Number (MPN): PCV-R2400-UVFS-25.4-ET6.35-ULLM8SHL
FindLight SKU: FL-24429

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Features

  • Optimized for 1030 nm laser systems
  • Plano-concave spherical mirror with -2400 mm radius of curvature for beam focusing and collimation
  • Reflectivity greater than 99.9% at 1030 nm using high-density IBS dielectric coating
  • Designed for 0° angle of incidence operation25.4 mm diameter UV fused silica substrate with 6.35 mm edge thickness
  • Surface irregularity better than λ/8 over the clear aperture for high wavefront quality
  • Excellent thermal stability, low scatter, and low absorption for high-power laser applications
  • Suitable for ultrafast, CW, and high-energy laser systems operating around 1030 nm

Applications

  • Beam focusing and collimation in 1030 nm Yb and Yb-fiber laser systems
  • Laser resonators and optical cavities
  • High-power and ultrafast laser beam delivery systems
  • Industrial laser material processing and micromachining
  • Scientific research in ultrafast optics and photonics laboratories
  • OEM laser modules and precision optical instruments
  • Advanced laser test benches and beam conditioning systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the PCV-R2400-UVFS-25.4-ET6.35-ULLM8SHL designed for?
This optic is a precision plano-concave spherical mirror designed for focusing, collimating, and directing laser beams in high-power and ultrafast laser systems operating around 1030 nm. It is commonly used in Yb-based laser platforms, optical resonators, and scientific research systems.
Why is a plano-concave spherical mirror used instead of a flat mirror?
Unlike a flat mirror that simply redirects a beam, a plano-concave spherical mirror can modify the beam's propagation by focusing or collimating it. This makes it valuable in optical cavities, beam shaping systems, and laser delivery assemblies where precise control of the beam profile is required.
What are the advantages of the IBS coating?
Ion Beam Sputtered (IBS) coatings produce dense, durable dielectric layers with excellent environmental stability, very low absorption, minimal scattering, and high reflectivity. These characteristics help maintain optical performance even under prolonged exposure to high laser power.
Why is UV fused silica selected as the substrate?
UV fused silica offers excellent optical homogeneity, low thermal expansion, high laser damage resistance, and very low absorption across a broad spectral range. These properties make it an excellent substrate for precision laser optics used in demanding industrial and scientific environments.
Which applications benefit most from this spherical mirror?
The PCV-R2400-UVFS-25.4-ET6.35-ULLM8SHL is well suited for ultrafast laser systems, high-power Yb and Yb-fiber lasers, optical resonators, beam shaping assemblies, laser material processing equipment, research laboratories, and OEM photonics platforms that require precise beam control and long-term optical stability.

Got more questions? Use the inquiry form to ask the supplier directly.

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