Description
The OPTOMAN PCV-R1500-UVFS-12.7-ET6.35-LLM313 is a precision plano-concave laser mirror engineered for demanding high-power laser applications at 1030 nm. Manufactured from premium UV fused silica and coated using advanced ion beam sputtering (IBS) technology, this mirror delivers greater than 99.95% reflectivity across the 1010–1060 nm wavelength range, ensuring exceptional optical efficiency, low absorption, and long-term durability.
Featuring a -1500 mm radius of curvature, 12.7 mm diameter, and 6.35 mm edge thickness, this mirror is optimized for beam shaping, resonator cavities, and industrial ultrafast laser systems. Its superior surface quality and high laser-induced damage threshold make it an excellent choice for OEM laser manufacturers, scientific research, and precision laser processing applications where reliability and stable optical performance are essential.
PCV-R1500-UVFS-12.7-ET6.35-LLM313 Plano-Concave UV Fused Silica Laser Mirror,
Specifications
| Substrate Material: | UVFS |
|---|---|
| Diameter: | 12.7 mm |
| Edge Thickness: | 6.35 mm |
| S1 Surface: | Concave |
| S2 Surface: | Flat |
| Radius Of Curvature, S1: | -1500 mm |
| Radius Of Curvature, S2: | Not Specified |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Commercial Polish |
| Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): | <= Lambda/8 |
| Max Centration Error: | 3 arcmin |
| Reflectance (@ Peak Wavelength Range, @ AOI): | 99.95 % |
| GDD R: | Not Specified |
| Manufacturer Part Number (MPN): | PCV-R1500-UVFS-12.7-ET6.35-LLM313 |
| FindLight SKU: | FL-24602 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PCV-R1500-UVFS-12.7-ET6.35-LLM313
- Plano-concave mirror with -1500 mm radius of curvature● Premium UV fused silica substrate for excellent thermal stability and low optical absorption
- IBS dielectric coating providing HR >99.95% reflectivity from 1010–1060 nm
- Optimized for 1030 nm laser systems
- Designed for 0° angle of incidence
- High laser-induced damage threshold for demanding high-power applications
- 12.7 mm diameter with 6.35 mm thickness for straightforward integration into optical assemblies
- Excellent wavefront quality (<λ/8 over clear aperture) for precise beam control
- Suitable for continuous-wave, pulsed, and ultrafast laser systems requiring long-term coating stability.
Applications
- High-power fiber laser systems
- Ytterbium laser resonators operating near 1030 nm
- Ultrafast laser beam delivery
- Scientific laser laboratories
- Precision micromachining and materials processing
- Industrial laser manufacturing equipment
- Optical cavity design and beam shaping
- Research and photonics instrumentation
- OEM laser system integration● Laser amplifier and oscillator assemblies
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the primary operating wavelength of this mirror?
Why is UV fused silica used as the substrate?
What does the -1500 mm radius of curvature indicate?
Is this mirror suitable for high-power industrial lasers?
Which industries commonly use this optical mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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