Thumbnail of PCV-R1000-UVFS-50.8-ET9.52-UBBHR38 Ultrafast IBS Concave Spherical MPC Mirror, 925–1170 nm photo 1
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Description

The OPTOMAN PCV-R1000-UVFS-50.8-ET9.52-UBBHR38 is a premium ion beam sputtered (IBS) concave spherical mirror engineered for ultrafast laser systems operating across the 925–1170 nm spectral range. Featuring a -1000 mm radius of curvature, UV fused silica (JGS1) substrate, and reflectivity exceeding 99.9%, this mirror delivers exceptional optical efficiency while maintaining minimal group delay dispersion (GDD) for femtosecond pulse preservation.

Designed specifically for multipass cell (MPC) architectures, the mirror minimizes absorption, scattering, and pulse distortion, making it ideal for spectral broadening, pulse compression, and high-power ultrafast laser applications. Its precision-polished optical surface, λ/10 surface irregularity, and high laser-induced damage threshold ensure reliable long-term performance in demanding scientific and industrial environments.

PCV-R1000-UVFS-50.8-ET9.52-UBBHR38 Ultrafast IBS Concave Spherical MPC Mirror, 925–1170 nm

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Specifications

Substrate Material: UVFS
Diameter: 50.8 mm
Edge Thickness: 9.52 mm
S1 Surface: Concave
S2 Surface: Flat
Radius Of Curvature, S1: -1000 mm
Radius Of Curvature, S2: Not Specified
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Unspecified
Surface Irregularity, S1/S2 (@ 633nm Over CA Or Per Manufacturer): <= Lambda/10
Max Centration Error: 3 arcmin
Reflectance (@ Peak Wavelength Range, @ AOI): 99.9 %
GDD R: 50 fs^2
Manufacturer Part Number (MPN): PCV-R1000-UVFS-50.8-ET9.52-UBBHR38
FindLight SKU: FL-24597

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Features

  • Manufacturer Part Number: PCV-R1000-UVFS-50.8-ET9.52-UBBHR38
  • Optimized high-reflectivity coating (>99.9%) for 925–1170 nm ultrafast laser systems.
  • Precision -1000 mm radius of curvature provides accurate beam shaping for multipass optical designs.
  • Low GDD (<50 fs² from 950–1150 nm, 0° AOI) helps preserve ultrashort pulse duration.
  • Premium UV fused silica (JGS1) substrate offers excellent thermal stability and low absorption.
  • Advanced Ion Beam Sputtering (IBS) coating delivers outstanding durability, low scatter, and long coating lifetime.
  • 50.8 mm diameter with over 41 mm clear aperture maximizes usable optical area.
  • λ/10 surface irregularity and 20-10 scratch-dig surface quality support high-precision beam control.
  • High laser-induced damage threshold suitable for high-energy femtosecond and picosecond laser systems.
  • Laser-engraved orientation mark and radius identification simplify system integration.

Applications

  • Multipass cell (MPC) pulse compression
  • Femtosecond laser pulse compression systems
  • Spectral broadening stages
  • Chirped Pulse Amplification (CPA) laser systems
  • Ultrafast fiber laser architectures
  • Ytterbium-based laser systems operating near 1030 nm
  • High-power scientific laser experiments
  • Precision nonlinear optics research
  • Industrial ultrafast laser processing
  • Optical research laboratories and photonics development platforms

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary purpose of the PCV-R1000-UVFS-50.8-ET9.52-UBBHR38 mirror?
This mirror is designed for multipass cell (MPC) and ultrafast laser systems where extremely high reflectivity, minimal pulse distortion, and excellent beam quality are required for pulse compression and spectral broadening.
Which laser wavelengths is this mirror optimized for?
The IBS coating is optimized for operation from 925 nm to 1170 nm, making it particularly suitable for Yb-based ultrafast laser systems centered around 1030 nm while maintaining reflectivity above 99.9%.
Why is low group delay dispersion important?
Low GDD minimizes temporal broadening of ultrashort laser pulses, allowing femtosecond lasers to maintain pulse duration and peak power throughout complex optical systems.
What benefits does the UV fused silica substrate provide?
UV fused silica offers excellent optical homogeneity, low thermal expansion, high laser damage resistance, and low absorption, making it an ideal substrate for demanding ultrafast laser applications.
Is this mirror suitable for high-power industrial and research laser systems?
Yes. The combination of IBS coating, high reflectivity, precision optical polishing, and high laser-induced damage threshold makes it well suited for high-power industrial processing, advanced photonics research, and scientific ultrafast laser installations.

Got more questions? Use the inquiry form to ask the supplier directly.

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