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Description

The OPTOMAN PP-UVFS-50.8-3.0-DM77-AR120 is an ultrafast dichroic mirror engineered for precise wavelength separation in advanced laser systems. Manufactured with a UV fused silica (UVFS) substrate and high-performance ion beam sputtered (IBS) dielectric coatings, this optical component provides high reflectivity at 515 nm while minimizing reflection losses at 1030 nm.

With a 50.8 mm diameter, 3.0 mm thickness, and optimized 45° angle of incidence, this harmonic separator mirror is suitable for demanding ultrafast laser applications requiring excellent spectral selectivity, low dispersion, and reliable performance under high-power operating conditions.

The PP-UVFS-50.8-3.0-DM77-AR120 is ideal for applications including frequency conversion systems, femtosecond laser setups, nonlinear optics, and precision photonics instrumentation where efficient separation of fundamental and harmonic wavelengths is required.

PP-UVFS-50.8-3.0-DM77-AR120 Ultrafast Dichroic Mirror 50.8mm UVFS

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Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 50.8 mm
Thickness: 3 mm
Clear Aperture (CA): 90 %
Optimized AOI: 45 – 45 deg
High Reflection Wavelength: 500 – 530 nm
High Transmission Wavelength: 1030 – 1030 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 99.9 – 99.9 %
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Manufacturer Part Number (MPN): PP-UVFS-50.8-3.0-DM77-AR120
FindLight SKU: FL-24651

Got questions about specs? Use the inquiry form to ask.

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Features

  • High-performance ultrafast dichroic mirror for 515 nm reflection and 1030 nm transmission applications
  • UV fused silica (UVFS) substrate for excellent thermal stability and optical durability
  • Ion beam sputtered (IBS) coating technology for superior spectral performance and coating reliability
  • High reflectivity exceeding 99% at 515 nm with low reflectance at 1030 nm
  • Low group delay dispersion (GDD) below 20 fs² for ultrafast pulse preservation
  • Precision 50.8 mm diameter, 3.0 mm thick optical design
  • Optimized for 45° angle of incidence laser beam separation
  • High-quality optical surfaces with MIL 20-10 scratch-dig specifications

Applications

  • Ultrafast laser harmonic separation and wavelength splitting
  • Femtosecond and picosecond laser systems
  • Second harmonic generation (SHG) setups
  • Pump and probe laser experiments
  • Biomedical imaging and nonlinear microscopy systems
  • Precision scientific research instruments
  • High-power laser beam routing and optical diagnostics

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 0%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the OPTOMAN PP-UVFS-50.8-3.0-DM77-AR120 designed for?
The PP-UVFS-50.8-3.0-DM77-AR120 is an ultrafast dichroic mirror designed to separate 515 nm and 1030 nm laser wavelengths, making it suitable for harmonic generation, beam routing, and ultrafast laser applications.
What wavelengths does this dichroic mirror support?
This mirror provides high reflectivity at 515 nm while allowing efficient transmission behavior around 1030 nm, making it suitable for frequency-doubled Yb-based laser systems and related ultrafast applications.
What substrate material is used in this optical mirror?
The mirror uses UV fused silica (UVFS, Corning 7980 0F) as the substrate material, offering excellent thermal stability, low expansion, and reliable performance in demanding laser environments.
Why is IBS coating technology used for this dichroic mirror?
Ion beam sputtered coatings provide highly accurate thin-film structures with excellent durability, low absorption, and stable optical performance, which are critical for high-power and ultrafast laser systems.
Can this mirror be used in femtosecond laser applications?
Yes. The low GDD specification and ultrafast coating design help minimize pulse distortion, making the PP-UVFS-50.8-3.0-DM77-AR120 suitable for femtosecond laser systems, nonlinear optics, and precision photonics experiments.

Got more questions? Use the inquiry form to ask the supplier directly.

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