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Description

The OPTOMAN PP-UVFS-25.4-3.0-DM440-AR806 is a precision ion beam sputtered (IBS) dichroic mirror designed for demanding ultrafast and UV laser applications. Manufactured on a high-quality UV fused silica (UVFS) substrate, this optic delivers greater than 98% reflectance across the 258–272 nm spectral range while providing over 97.5% transmission from 700–900 nm at a 45° angle of incidence.

Its durable IBS coating ensures exceptional optical stability, low absorption, and long-term reliability under high laser fluence. The 25.4 mm diameter and 3 mm thickness make this dichroic mirror an excellent choice for UV beam separation, harmonic generation systems, femtosecond laser setups, spectroscopy instruments, and advanced scientific research where precise wavelength management is essential.

PP-UVFS-25.4-3.0-DM440-AR806 UV Dichroic Mirror HR 258–272 nm HT 700–900 nm

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Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 25.4 mm
Thickness: 3 mm
Clear Aperture (CA): 80 %
Optimized AOI: 45 – 45 deg
High Reflection Wavelength: 258 – 272 nm
High Transmission Wavelength: 700 – 900 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 98 – 98 %
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): 10-5
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/10
Manufacturer Part Number (MPN): PP-UVFS-25.4-3.0-DM440-AR806
FindLight SKU: FL-24666

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-3.0-DM440-AR806
  • High reflectivity >98% across the 258–272 nm ultraviolet wavelength range
  • High transmission >97.5% throughout the 700–900 nm spectral band
  • Premium UV fused silica (UVFS) substrate for excellent UV transmission and thermal stability
  • Advanced Ion Beam Sputtering (IBS) coating provides outstanding durability, low scatter, and low absorption
  • Optimized for 45° angle of incidence in beam combining and beam separation systems
  • Precision 25.4 mm diameter with 3 mm thickness for seamless integration into standard optical mounts
  • Suitable for ultrafast, high-power, and scientific laser applications requiring stable spectral performance

Applications

  • UV laser beam separation
  • Harmonic generation and frequency conversion systems
  • Femtosecond and picosecond laser platforms
  • Fluorescence spectroscopy instruments
  • Biomedical and life science optical systems
  • Semiconductor inspection equipment
  • Laser spectroscopy and analytical instrumentation
  • Scientific research laboratories
  • Optical beam combining systems
  • High-performance photonics and laser development

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary function of the PP-UVFS-25.4-3.0-DM440-AR806 dichroic mirror?
This dichroic mirror is designed to efficiently reflect ultraviolet wavelengths between 258 and 272 nm while transmitting near-infrared wavelengths from 700 to 900 nm, enabling precise beam separation or combination in advanced optical systems.
Why is Ion Beam Sputtering (IBS) coating beneficial?
IBS coatings produce dense, durable optical films with excellent environmental stability, minimal optical losses, high laser damage resistance, and consistent spectral performance, making them ideal for demanding laser applications.
What types of lasers are compatible with this optic?
The mirror is well suited for ultrafast femtosecond and picosecond laser systems, UV laser sources, harmonic generation setups, and other scientific laser platforms operating within the specified wavelength ranges.
Can this mirror be used in high-power laser systems?
Yes. Its UV fused silica substrate combined with a robust IBS coating provides excellent stability and durability for many high-power and ultrafast laser applications when operated within the manufacturer's specified laser damage limits.
What industries commonly use this dichroic mirror?
This optic is widely used in photonics research, spectroscopy, semiconductor manufacturing, biomedical instrumentation, laser development, optical metrology, and industrial laser integration where precise wavelength separation is required.

Got more questions? Use the inquiry form to ask the supplier directly.

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