Description
The OPTOMAN PP-UVFS-20.0-5.0-DM376-DM376 is a premium ion beam sputtered (IBS) dichroic mirror engineered for demanding UV, visible, near-infrared, and short-wave infrared laser applications. Manufactured on a precision 20 mm UV fused silica substrate, this optic delivers high reflectivity of s-polarized light in the 230–290 nm spectral range while efficiently transmitting multiple visible, NIR, and SWIR wavelength bands. Its optimized coating design provides exceptional spectral separation, low absorption, excellent environmental durability, and stable optical performance even in high-power laser environments.
Designed for operation at a 60° angle of incidence, this dichroic mirror is well suited for advanced laser beam combining, harmonic separation, fluorescence systems, and scientific instrumentation requiring reliable wavelength management.
PP-UVFS-20.0-5.0-DM376-DM376 UV Fused Silica Dichroic Mirror
Specifications
| Substrate Material: | UV-grade Fused Silica (UVFS) |
|---|---|
| Shape: | Circular |
| Diameter: | 20 mm |
| Thickness: | 5 mm |
| Clear Aperture (CA): | 90 % |
| Optimized AOI: | 60 – 60 deg |
| High Reflection Wavelength: | 230 – 290 nm |
| High Transmission Wavelength: | 1600 – 2600 nm |
| Reflectance, S1 (@ HR Wavelength, @ AOI): | 98.5 – 98.5 % |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | 20-10 |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | <= Lambda/10 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | <= Lambda/10 |
| Manufacturer Part Number (MPN): | PP-UVFS-20.0-5.0-DM376-DM376 |
| FindLight SKU: | FL-24662 |
Got questions about specs? Use the inquiry form to ask.
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Features
- Manufacturer Part Number: PP-UVFS-20.0-5.0-DM376-DM376
- Precision 20 mm diameter UV fused silica substrate with 5 mm thickness for excellent thermal and mechanical stability
- High s-polarization reflectivity HRs >98.5% at 230–290 nm
- High p-polarization transmission HTp >95% at 460–580 nm and 1100–1600 nm
- Efficient s-polarization transmission HTs >80% at 760–830 nm
- Maintains HTs >70% across 1600–2600 nm for extended infrared compatibility
- Optimized for 60° angle of incidence in demanding optical systems
- Ion Beam Sputtering (IBS) coating technology provides high laser damage resistance, low scatter, and long-term coating durability
- Ideal for high-power laser systems requiring precise wavelength separation and minimal spectral drift
Applications
- UV laser beam combining systems
- Harmonic separation in ultrafast laser systems
- Fluorescence microscopy and bioimaging instruments
- Multi-wavelength laser beam delivery
- Scientific spectroscopy equipment
- High-power laser resonators
- Optical research laboratories
- Industrial laser processing systems
- Advanced photonics and OEM optical integration
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the primary function of the PP-UVFS-20.0-5.0-DM376-DM376 dichroic mirror?
This dichroic mirror selectively reflects ultraviolet wavelengths between 230 and 290 nm while transmitting several visible, near-infrared, and short-wave infrared wavelength bands, enabling efficient wavelength separation in complex optical systems.
Why is Ion Beam Sputtering (IBS) beneficial for this optic?
IBS coatings produce dense, durable dielectric layers with extremely low absorption, excellent environmental stability, minimal spectral drift, and high laser damage thresholds, making them ideal for precision laser applications.
At what angle should this mirror be operated?
The coating is specifically optimized for a 60° angle of incidence, where it achieves its specified reflection and transmission performance.
Which laser systems can benefit from this dichroic mirror?
It is suitable for UV laser systems, ultrafast lasers, fluorescence imaging platforms, spectroscopy instruments, harmonic generation setups, and multi-wavelength beam combining applications requiring stable optical performance.
Why is UV fused silica used as the substrate material?
UV fused silica offers outstanding transmission from the ultraviolet through the infrared, low thermal expansion, excellent optical homogeneity, and high resistance to laser-induced damage, making it an ideal substrate for demanding photonics applications.
Got more questions? Use the inquiry form to ask the supplier directly.
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