Description
The OPTOMAN PP-UVFS-12.7-3.0-DM214-AR362 is a premium UV harmonic separator dichroic mirror engineered for demanding ultraviolet laser systems. Manufactured on a high-quality UV fused silica substrate, this 12.7 mm optic utilizes advanced Ion Beam Sputtering (IBS) coating technology to deliver exceptional optical performance, long-term stability, and high laser damage resistance.
The coating is optimized to provide greater than 99.5% s-polarized reflection at 257 nm while maintaining less than 1% p-polarized reflection at 515 nm at a 45Β° angle of incidence, making it ideal for harmonic separation in ultrafast and high-power laser applications. Its enhanced lifetime coating design ensures reliable operation in industrial, scientific, and research environments where optical durability and consistent performance are critical.
PP-UVFS-12.7-3.0-DM214-AR362 UV Laser Dichroic Mirror for 257 nm and 515 nm
Specifications
| Substrate Material: | UV-grade Fused Silica (UVFS) |
|---|---|
| Shape: | Circular |
| Diameter: | 12.7 mm |
| Thickness: | 3 mm |
| Clear Aperture (CA): | 80 % |
| Optimized AOI: | 45 β 45 deg |
| High Reflection Wavelength: | 257 β 257 nm |
| High Transmission Wavelength: | 515 β 515 nm |
| Reflectance, S1 (@ HR Wavelength, @ AOI): | 99.5 β 99.5 % |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Unspecified |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | <= Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | <= Lambda/8 |
| Manufacturer Part Number (MPN): | PP-UVFS-12.7-3.0-DM214-AR362 |
| FindLight SKU: | FL-24675 |
Got questions about specs? Use the inquiry form to ask.
Features
- Manufacturer Part Number: PP-UVFS-12.7-3.0-DM214-AR362
- Premium UV fused silica substrate for excellent UV transmission and thermal stability
- Advanced Ion Beam Sputtering (IBS) coating for superior environmental durability
- Enhanced lifetime coating designed for prolonged operation under demanding laser conditions
- Optimized harmonic separator for 257 nm and 515 nm laser wavelengths
- Reflectance: Rs >99.5% @ 257 nm
- Reflection: Rp <1% @ 515 nm
- Diameter: 12.7 mm
- Thickness: 3.0 mm
- Designed for 45Β° angle of incidence
- High laser damage threshold suitable for UV and ultrafast laser systems
- Precision optical polishing with high surface quality for minimal scatter and wavefront distortion
Applications
- UV harmonic separation in frequency-converted laser systems
- Industrial UV laser processing equipment
- Scientific laser laboratories
- Ultrafast femtosecond laser systems
- Nonlinear optics experiments
- Semiconductor inspection system
- Β Laser spectroscopy instruments
- Fluorescence and Raman microscopy
- Biomedical laser instrumentation
- High-power laser research and development
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the primary purpose of the PP-UVFS-12.7-3.0-DM214-AR362?
Why is Ion Beam Sputtering (IBS) coating beneficial?
Can this mirror be used with high-power UV lasers?
What industries commonly use this harmonic separator?
Why is UV fused silica chosen as the substrate?
Got more questions? Use the inquiry form to ask the supplier directly.
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