Description
The OPTOMAN PP-UVFS-25.4-2.0-DM368-DM369 is a premium deep-UV dichroic mirror engineered for precise wavelength separation in demanding laser and spectroscopy applications. Manufactured on a high-quality UV fused silica substrate using advanced Ion Beam Sputtering (IBS) technology, this optic delivers exceptional optical durability, low scattering, and excellent environmental stability.
Designed for operation at a 45° angle of incidence, the mirror provides greater than 99% s-polarized reflection at 195–201 nm while maintaining less than 1% p-polarized reflection at 261–267 nm, enabling efficient beam separation in deep-ultraviolet optical systems. The precision-polished 25.4 mm substrate features λ/6 surface flatness and 10-5 scratch-dig surface quality, making it well suited for ultrafast laser platforms, scientific research, nonlinear optics, and advanced photonic instrumentation where reliable UV performance is essential.
PP-UVFS-25.4-2.0-DM368-DM369 Deep-UV Dichroic Mirror
Specifications
| Substrate Material: | UV-grade Fused Silica (UVFS) |
|---|---|
| Shape: | Circular |
| Diameter: | 25.4 mm |
| Thickness: | 2 mm |
| Clear Aperture (CA): | 80 % |
| Optimized AOI: | 45 – 45 deg |
| High Reflection Wavelength: | 195 – 201 nm |
| High Transmission Wavelength: | 780 – 800 nm |
| Reflectance, S1 (@ HR Wavelength, @ AOI): | 99 – 99 % |
| Surface Quality, S1 (scratch-dig): | 10-5 |
| Surface Quality, S2 (scratch-dig): | 10-5 |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | <= Lambda/6 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | <= Lambda/6 |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-2.0-DM368-DM369 |
| FindLight SKU: | FL-24665 |
Got questions about specs? Use the inquiry form to ask.
Features
- Manufacturer Part Number: PP-UVFS-25.4-2.0-DM368-DM369
- Deep-UV dichroic mirror optimized for wavelength separation at 195–201 nm and 261–267 nm
- Rs >99% reflection at 195–201 nm for efficient UV beam steering
- Rp <1% at 261–267 nm for excellent spectral separation
- Additional suppression with Rs <10% at 390–400 nm and 780–800 nm
- Precision 25.4 mm diameter, 2 mm thick UV fused silica substrate
- Advanced Ion Beam Sputtering (IBS) coating for outstanding durability and coating stability
- Designed for 45° angle of incidence
- High optical quality with λ/6 surface flatness and 10-5 scratch-dig finish
- Ideal for high-performance deep-UV laser and spectroscopy systems
Applications
- Deep-UV laser beam separation
- Ultrafast laser systems
- Harmonic generation experiments
- Laser spectroscopy instrumentation
- Fluorescence and photochemistry research
- Scientific optical laboratories
- Nonlinear optics experiments
- Advanced photonic research platforms
- Precision UV beam delivery systems
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the primary function of the PP-UVFS-25.4-2.0-DM368-DM369?
Why is Ion Beam Sputtering (IBS) beneficial for this optic?
What laser systems is this mirror compatible with?
What substrate material is used?
Can this mirror be integrated into scientific and industrial optical systems?
Got more questions? Use the inquiry form to ask the supplier directly.
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