Description

The OPTOMAN PP-UVFS-25.4-2.0-DM368-DM369 is a premium deep-UV dichroic mirror engineered for precise wavelength separation in demanding laser and spectroscopy applications. Manufactured on a high-quality UV fused silica substrate using advanced Ion Beam Sputtering (IBS) technology, this optic delivers exceptional optical durability, low scattering, and excellent environmental stability.

Designed for operation at a 45° angle of incidence, the mirror provides greater than 99% s-polarized reflection at 195–201 nm while maintaining less than 1% p-polarized reflection at 261–267 nm, enabling efficient beam separation in deep-ultraviolet optical systems. The precision-polished 25.4 mm substrate features λ/6 surface flatness and 10-5 scratch-dig surface quality, making it well suited for ultrafast laser platforms, scientific research, nonlinear optics, and advanced photonic instrumentation where reliable UV performance is essential.

PP-UVFS-25.4-2.0-DM368-DM369 Deep-UV Dichroic Mirror

Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 25.4 mm
Thickness: 2 mm
Clear Aperture (CA): 80 %
Optimized AOI: 45 – 45 deg
High Reflection Wavelength: 195 – 201 nm
High Transmission Wavelength: 780 – 800 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 99 – 99 %
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): 10-5
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/6
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/6
Manufacturer Part Number (MPN): PP-UVFS-25.4-2.0-DM368-DM369
FindLight SKU: FL-24665

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-2.0-DM368-DM369
  • Deep-UV dichroic mirror optimized for wavelength separation at 195–201 nm and 261–267 nm
  • Rs >99% reflection at 195–201 nm for efficient UV beam steering
  • Rp <1% at 261–267 nm for excellent spectral separation
  • Additional suppression with Rs <10% at 390–400 nm and 780–800 nm
  • Precision 25.4 mm diameter, 2 mm thick UV fused silica substrate
  • Advanced Ion Beam Sputtering (IBS) coating for outstanding durability and coating stability
  • Designed for 45° angle of incidence
  • High optical quality with λ/6 surface flatness and 10-5 scratch-dig finish
  • Ideal for high-performance deep-UV laser and spectroscopy systems

Applications

  • Deep-UV laser beam separation
  • Ultrafast laser systems
  • Harmonic generation experiments
  • Laser spectroscopy instrumentation
  • Fluorescence and photochemistry research
  • Scientific optical laboratories
  • Nonlinear optics experiments
  • Advanced photonic research platforms
  • Precision UV beam delivery systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary function of the PP-UVFS-25.4-2.0-DM368-DM369?
This dichroic mirror separates deep-ultraviolet wavelengths by providing high reflection for 195–201 nm while transmitting the designated polarization at 261–267 nm, enabling efficient wavelength management in advanced optical systems.
Why is Ion Beam Sputtering (IBS) beneficial for this optic?
IBS produces dense, highly durable optical coatings with excellent spectral accuracy, low absorption, minimal scattering, and superior long-term stability compared to conventional deposition methods.
What laser systems is this mirror compatible with?
The mirror is designed for deep-UV and ultrafast laser systems requiring precise wavelength separation around 195–201 nm and 261–267 nm, including research lasers, spectroscopy setups, and nonlinear optical experiments.
What substrate material is used?
The optic is manufactured from UV fused silica, providing excellent ultraviolet transmission, high optical quality, low thermal expansion, and outstanding resistance to laser-induced damage.
Can this mirror be integrated into scientific and industrial optical systems?
Yes. Its precision optical specifications, robust IBS coating, and high-performance deep-UV characteristics make it suitable for research laboratories, OEM laser equipment, spectroscopy instruments, and other demanding photonics applications.

Got more questions? Use the inquiry form to ask the supplier directly.

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