Description

The OPTOMAN PP-UVFS-25.4-6.35-DM265-AR465 is a precision ion beam sputtered (IBS) ultrafast dichroic mirror engineered for efficient harmonic separation in Yb:YAG, Yb:KGW, and Yb:KYW ultrafast laser systems. Designed for operation at a 45° angle of incidence, it provides greater than 99.5% s-polarized reflectance at 257 nm while delivering greater than 99% p-polarized transmission at both 515 nm and 1030 nm, enabling highly efficient beam routing with minimal optical loss.

Manufactured on a premium UV fused silica substrate with high surface quality and λ/10 flatness, this mirror preserves beam quality while supporting demanding femtosecond and picosecond laser applications. The advanced IBS coating technology offers excellent environmental stability, low absorption, high laser damage resistance, and long-term reliability for industrial, scientific, and research environments.

PP-UVFS-25.4-6.35-DM265-AR465 UV Dichroic Mirror 257 nm515 nm 1030 nm

Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 25.4 mm
Thickness: 6.35 mm
Clear Aperture (CA): 90 %
Optimized AOI: 45 – 45 deg
High Reflection Wavelength: 257 – 257 nm
High Transmission Wavelength: 515 – 1030 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 99.5 – 99.5 %
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/10
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-DM265-AR465
FindLight SKU: FL-24641

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-DM265-AR465
  • Optimized for harmonic separation of 257 nm, 515 nm, and 1030 nm ultrafast laser wavelengths
  • >99.5% s-polarized reflectance at 257 nm
  • >99% p-polarized transmission at 515 nm and 1030 nm
  • Optimized for 45° angle of incidence
  • Ion Beam Sputtered (IBS) dielectric coating for exceptional durability and coating stability
  • UV fused silica (Corning 7980 0F) substrate for superior optical performance
  • 25.4 mm diameter with 6.35 mm thickness
  • λ/10 surface flatness and 20-10 scratch-dig surface quality
  • High laser damage threshold suitable for femtosecond and picosecond laser systems
  • Excellent beam quality preservation with minimal pulse distortion

Applications

  • Harmonic separation in Yb:YAG ultrafast laser systems
  • Femtosecond laser beam routing
  • Picosecond laser processing equipment
  • Ultrafast spectroscopy systems
  • Nonlinear optics experiments
  • UV laser beam delivery
  • Laser micromachining platforms
  • Scientific research laboratories
  • Industrial laser manufacturing systems
  • Optical system integration for high-power ultrafast lasers

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary purpose of the PP-UVFS-25.4-6.35-DM265-AR465?
This dichroic mirror is designed to separate harmonic wavelengths in ultrafast laser systems by reflecting 257 nm while transmitting 515 nm and 1030 nm, making it ideal for Yb-based laser architectures.
Which laser systems is this mirror compatible with?
The mirror is optimized for Yb:YAG, Yb:KGW, and Yb:KYW femtosecond and picosecond laser systems operating with 257 nm, 515 nm, and 1030 nm harmonic wavelengths.
Why is Ion Beam Sputtering (IBS) beneficial for this optic?
IBS coatings provide dense, low-defect dielectric layers with excellent environmental stability, low optical losses, high laser damage resistance, and outstanding long-term performance under demanding laser conditions.
What optical quality does this mirror provide?
The optic features a UV fused silica substrate with λ/10 surface flatness, 20-10 scratch-dig surface quality, and a clear aperture greater than 21 mm, helping maintain excellent beam quality in precision optical systems.
Can this mirror be used in high-power ultrafast laser applications?
Yes. Its IBS dielectric coating and precision optical substrate are specifically engineered for high-peak-power femtosecond and picosecond laser systems where high laser damage threshold, stable performance, and efficient wavelength separation are essential.

Got more questions? Use the inquiry form to ask the supplier directly.

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