Description
The OPTOMAN PP-UVFS-25.4-3.0-DM77-AR120 is a premium ultrafast dichroic mirror engineered for demanding femtosecond and picosecond laser applications. Manufactured on a UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this optic delivers exceptionally high reflectivity at 515 nm while minimizing reflection at 1030 nm, enabling efficient beam separation with extremely low absorption and excellent long-term stability.
Designed for a 45° angle of incidence, the mirror offers outstanding wavefront quality, high laser-induced damage resistance, and reliable performance in high-average-power laser systems, making it an excellent choice for industrial laser processing, nonlinear optics, harmonic separation, and scientific research.
PP-UVFS-25.4-3.0-DM77-AR120 Ultrafast Dichroic Mirror 515 nm 1030 nm
Specifications
| Substrate Material: | UV-grade Fused Silica (UVFS) |
|---|---|
| Shape: | Circular |
| Diameter: | 25.4 mm |
| Thickness: | 3 mm |
| Clear Aperture (CA): | 90 % |
| Optimized AOI: | 45 – 45 deg |
| High Reflection Wavelength: | 500 – 530 nm |
| High Transmission Wavelength: | 1030 – 1030 nm |
| Reflectance, S1 (@ HR Wavelength, @ AOI): | 99.9 – 99.9 % |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | 20-10 |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | <= Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | <= Lambda/8 |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-3.0-DM77-AR120 |
| FindLight SKU: | FL-24617 |
Got questions about specs? Use the inquiry form to ask.
Features
- Delivers >99.5% reflectivity at 515 nm for highly efficient beam reflection.
- Maintains <5% reflectance at 1030 nm, allowing effective wavelength separation.
- Optimized for 45° angle of incidence in ultrafast laser beam paths.
- UV fused silica substrate provides excellent thermal stability and low absorption.
- Ion Beam Sputtered (IBS) dielectric coating ensures high environmental durability and long-term spectral stability.
- Surface flatness better than λ/8 at 633 nm supports excellent beam quality preservation.
- Designed for high-power femtosecond and picosecond laser systems.
- Precision-manufactured for demanding scientific and industrial optical applications.
Applications
- Harmonic separation in ultrafast laser systems.
- Beam routing for frequency-doubled 515 nm laser sources.
- Yb-based laser systems operating at 1030 nm.
- Industrial laser micromachining equipment.
- Precision laser material processing.
- Nonlinear optical experiments.
- Multiphoton microscopy and advanced imaging systems.
- Scientific laser laboratories and photonics research
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the primary function of the PP-UVFS-25.4-3.0-DM77-AR120 dichroic mirror?
Why is Ion Beam Sputtering (IBS) coating important?
Can this mirror be used with femtosecond lasers?
What angle of incidence is recommended?
Which applications benefit most from this optic?
Got more questions? Use the inquiry form to ask the supplier directly.
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