Description

The OPTOMAN PP-UVFS-25.4-3.0-DM441-AR237 is a high-performance UV fused silica dichroic mirror designed for precise wavelength separation in Nd:YAG laser systems. Featuring an ion beam sputtered (IBS) coating structure, this 25.4 mm diameter optical element provides exceptional reflection at 532 nm and high transmission at 1064 nm with minimal absorption and excellent spectral stability. The mirror is optimized for normal incidence operation and offers reliable performance in demanding laser applications requiring efficient harmonic separation.

Manufactured with a UVFS substrate, the PP-UVFS-25.4-3.0-DM441-AR237 combines high optical durability, low scattering, and superior coating uniformity. Its narrowband dielectric coating design makes it suitable for integrating second harmonic separation functions into compact and high-precision optical assemblies.

PP-UVFS-25.4-3.0-DM441-AR237 532 nm 1064 nm UVFS Dichroic Mirror

Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 25.4 mm
Thickness: 3 mm
Clear Aperture (CA): 82 %
Optimized AOI: 0 – 0 deg
High Reflection Wavelength: 1064 – 1064 nm
High Transmission Wavelength: 532 – 532 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 99.6 – 99.6 %
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/8
Manufacturer Part Number (MPN): PP-UVFS-25.4-3.0-DM441-AR237
FindLight SKU: FL-24657

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Features

  • Optimized for 532 nm reflection and 1064 nm transmission in Nd:YAG laser applications
  • High-quality UV fused silica substrate for excellent optical clarity and thermal stability
  • Advanced dielectric coating technology for reliable wavelength separation performance
  • Low absorption design suitable for precision laser systems
  • Excellent surface quality and dimensional accuracy for demanding optical assemblies
  • 25.4 mm diameter standard format for easy integration into optical setups
  • Designed for high-performance photonics, laser, and research applications

Applications

  • Nd:YAG laser harmonic separation systems
  • 532 nm and 1064 nm laser beam splitting applications
  • Laser beam routing and optical path control
  • Scientific research and laboratory laser systems
  • Spectroscopy and optical measurement equipment
  • Industrial laser processing systems
  • Advanced photonics and imaging platforms

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the OPTOMAN PP-UVFS-25.4-3.0-DM441-AR237 dichroic mirror used for?
The OPTOMAN PP-UVFS-25.4-3.0-DM441-AR237 is used for separating laser wavelengths by reflecting 532 nm light and transmitting 1064 nm radiation, making it ideal for Nd:YAG laser harmonic separation and beam management applications.
What wavelengths does the PP-UVFS-25.4-3.0-DM441-AR237 support?
This dichroic mirror is designed for 532 nm and 1064 nm wavelengths, providing selective optical performance for frequency-doubled Nd:YAG laser systems.
What material is used for this optical mirror?
The mirror uses a UV fused silica substrate, which provides excellent transmission characteristics, low thermal expansion, and strong durability for precision optical applications.
What are the benefits of using a dielectric-coated dichroic mirror?
A dielectric-coated dichroic mirror provides high wavelength selectivity, improved optical efficiency, reduced absorption, and better long-term stability compared with conventional reflective coatings.
Can this OPTOMAN dichroic mirror be used in custom optical systems?
Yes, the PP-UVFS-25.4-3.0-DM441-AR237 can be integrated into customized laser, photonics, and optical instrumentation systems requiring accurate wavelength separation and beam control.

Got more questions? Use the inquiry form to ask the supplier directly.

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