Description
The OPTOMAN PP-UVFS-25.4-3.0-DM438-AR804EL is a high-performance UV-grade fused silica dichroic mirror engineered for wavelength separation in advanced ultrafast laser systems. Featuring a 25.4 mm diameter and 3 mm thickness, this non-degrading optical component uses ion beam sputtering (IBS) coating technology to provide reliable separation of 343 nm harmonic output from 515 nm and 1030 nm laser wavelengths.
Designed for Yb:YAG laser harmonic generation, the optic delivers high reflectivity for the third harmonic wavelength range while maintaining high transmission efficiency for fundamental and second harmonic wavelengths. Its UVFS substrate, precision surface quality, and long-life coating technology make it suitable for demanding scientific, industrial, and high-power ultrafast laser applications where optical stability and durability are critical.
PP-UVFS-25.4-3.0-DM438-AR804EL UVFS Dichroic Mirror for Yb:YAG Harmonic Separation
Specifications
| Substrate Material: | UV-grade Fused Silica (UVFS) |
|---|---|
| Shape: | Circular |
| Diameter: | 25.4 mm |
| Thickness: | 3 mm |
| Clear Aperture (CA): | 90 % |
| Optimized AOI: | 45 – 45 deg |
| High Reflection Wavelength: | 337 – 349 nm |
| High Transmission Wavelength: | 1015 – 1045 nm |
| Reflectance, S1 (@ HR Wavelength, @ AOI): | 99.6 – 99.6 % |
| Surface Quality, S1 (scratch-dig): | 10-5 |
| Surface Quality, S2 (scratch-dig): | 10-5 |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | <= Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | <= Lambda/8 |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-3.0-DM438-AR804EL |
| FindLight SKU: | FL-24656 |
Got questions about specs? Use the inquiry form to ask.
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Features
- High reflectance: HRs >99.6% at 337–349 nm for efficient UV harmonic separation
- High transmission: HTp >98% at 505–525 nm and HTs >98% at 1015–1045 nm
- UV-grade fused silica substrate with excellent durability and thermal stability
- Precision 25.4 mm diameter and 3 mm thickness design for integration into ultrafast laser systems
- Surface quality of 10-5 scratch-dig and high optical flatness for demanding applications
- Optimized for 45° angle-of-incidence wavelength separation in Yb:YAG laser platforms
- Designed for high-power and high-repetition-rate ultrafast laser operation
Applications
- Yb:YAG ultrafast laser harmonic generation systems
- Third harmonic generation (THG) beam separation at 343 nm
- UV laser machining and precision material processing systems
- Industrial femtosecond laser platforms
- Scientific research lasers and nonlinear optics experiments
- Pump wavelength separation in high-power laser architectures
- Ultrafast spectroscopy and photonics research equipment
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the OPTOMAN PP-UVFS-25.4-3.0-DM438-AR804EL used for?
What coating technology is used on this dichroic mirror?
What wavelengths does the PP-UVFS-25.4-3.0-DM438-AR804EL support?
Why is UV fused silica used as the substrate material?
Which laser systems are compatible with this wavelength separator?
Got more questions? Use the inquiry form to ask the supplier directly.
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