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Description

The OPTOMAN PP-UVFS-25.4-3.0-DM429-AR362 is a precision ion beam sputtered (IBS) ultrafast dichroic mirror engineered for efficient wavelength separation in femtosecond and picosecond laser systems. Designed for Yb:YAG-based ultrafast lasers, it provides greater than 99.5% reflection at 257.5 nm while transmitting more than 98% at 515 nm at a 45° angle of incidence. Its low-loss dielectric coating, high laser-induced damage threshold (LIDT), and low group delay dispersion (GDD) help preserve ultrashort pulse quality while ensuring exceptional long-term reliability.

Manufactured on a UV fused silica substrate with high surface quality and excellent flatness, this optic is ideal for demanding industrial, scientific, and research applications requiring stable UV-visible wavelength separation.

PP-UVFS-25.4-3.0-DM429-AR362 Ultrafast UV Dichroic Mirror 257.5 nm 515 nm

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Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 25.4 mm
Thickness: 3 mm
Clear Aperture (CA): 80 %
Optimized AOI: 45 – 45 deg
High Reflection Wavelength: 257.5 – 257.5 nm
High Transmission Wavelength: 515 – 515 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 99.5 – 99.5 %
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/10
Manufacturer Part Number (MPN): PP-UVFS-25.4-3.0-DM429-AR362
FindLight SKU: FL-24643

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-3.0-DM429-AR362
  • Ultrafast IBS-coated dichroic mirror optimized for 257.5 nm reflection and 515 nm transmission
  • Reflectance >99.5% at 257.5 nm and transmission >98% at 515 nm at 45° AOI
  • Anti-reflection coating on the rear surface minimizes reflection losses at 515 nm
  • Low group delay dispersion helps preserve femtosecond and picosecond pulse characteristics
  • High laser-induced damage threshold for demanding ultrafast laser environments
  • UV fused silica substrate with 25.4 mm diameter and 3 mm thickness
  • Surface quality of 20/10 scratch-dig and surface flatness better than λ/10 @ 633 nm
  • Precision optical fabrication with excellent parallelism for reliable beam alignment
  • Suitable for continuous operation in advanced laser laboratories and industrial photonics systems

Applications

  • Harmonic separation in ultrafast Yb:YAG laser systems
  • Femtosecond and picosecond laser beam routing
  • Ultrafast UV laser material processing
  • Nonlinear optics and frequency conversion setups
  • Multiphoton microscopy and advanced imaging systems
  • Laser spectroscopy and precision optical instrumentation
  • Scientific research laboratories
  • OEM laser integration and custom photonic systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

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Frequently Asked Questions

What is the primary purpose of the PP-UVFS-25.4-3.0-DM429-AR362? x
What is the primary purpose of the PP-UVFS-25.4-3.0-DM429-AR362? This dichroic mirror is designed to efficiently separate 257.5 nm and 515 nm wavelengths in ultrafast laser systems by reflecting the UV harmonic while transmitting the visible wavelength with minimal optical losses.
Which laser systems is this mirror designed for?
It is optimized for Yb:YAG-based ultrafast laser platforms that generate harmonic wavelengths requiring precise separation while maintaining pulse integrity.
Why is Ion Beam Sputtering (IBS) important for this optic?
IBS technology produces dense, highly stable dielectric coatings with low absorption, excellent environmental durability, high laser damage resistance, and consistent optical performance over extended operating periods.
Can this mirror be used with femtosecond lasers?
Yes. The coating is specifically engineered for femtosecond and picosecond laser applications, offering low group delay dispersion to minimize pulse distortion while maintaining high optical efficiency.
What applications benefit most from this wavelength separator?
The mirror is well suited for harmonic generation systems, nonlinear optical experiments, ultrafast laser processing, spectroscopy, advanced microscopy, and other precision photonics applications where efficient UV-visible wavelength separation is essential.

Got more questions? Use the inquiry form to ask the supplier directly.

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