Description

The OPTOMAN PP-UVFS-25.4-3.0-AR1168-DM594 is a premium ultrafast dichroic mirror engineered for demanding high-power laser applications requiring efficient wavelength separation between 1030 nm and 940 nm. Manufactured using advanced Ion Beam Sputtering (IBS) technology, this precision optical component delivers excellent reflectance at 1030 nm while maintaining high transmission at 940 nm, ensuring outstanding optical efficiency and long-term stability.

Designed on a UV fused silica substrate with a 25.4 mm diameter and 3 mm thickness, this dichroic mirror is optimized for a 45° angle of incidence and supports conical beam geometries over a 40–50° cone. Its durable dielectric coating offers exceptional resistance to laser-induced damage, making it an excellent choice for ultrafast fiber lasers, industrial laser systems, scientific research, and advanced photonics applications where reliability and beam quality are critical.

PP-UVFS-25.4-3.0-AR1168-DM594 Ultrafast Dichroic Mirror for 1030 nm 940 nm Lasers

Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 25.4 mm
Thickness: 3 mm
Clear Aperture (CA): 80 %
Optimized AOI: 45 – 45 deg
High Reflection Wavelength: 940 – 940 nm
High Transmission Wavelength: 1030 – 1030 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 99 – 99 %
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): 20-10
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/4
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/4
Manufacturer Part Number (MPN): PP-UVFS-25.4-3.0-AR1168-DM594
FindLight SKU: FL-24649

Got questions about specs? Use the inquiry form to ask.

Document icon Download Data Sheet Download icon

Features

  • Manufacturer Part Number: PP-UVFS-25.4-3.0-AR1168-DM594
  • Ultrafast dichroic mirror optimized for high-power femtosecond and picosecond laser systems
  • High reflectance: HRs >99% @ 1030 nm
  • High transmission: HTsp >98% @ 940 nm
  • Maintains HRs >99% and HRp >97% @ 1030 nm
  • Designed for 45° angle of incidence with optimized 940 nm transmission over a 40–50° cone
  • UV fused silica substrate with 25.4 mm diameter and 3 mm thickness
  • Surface flatness: < λ/4 over the clear aperture
  • Precision IBS dielectric coatings for excellent durability and low optical losses
  • Suitable for demanding industrial, scientific, and OEM laser systems requiring reliable wavelength management

Applications

  • Yb:YAG ultrafast laser systems
  • Beam combining and wavelength separation
  • High-power laser beam delivery
  • Industrial laser micromachining
  • Ultrafast laser processing equipment
  • Scientific laser laboratories
  • Optical amplifier systems
  • OEM photonics integration
  • Research and development laser platforms
  • Precision laser instrumentation

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary purpose of the PP-UVFS-25.4-3.0-AR1168-DM594? beam management in ultrafast laser systems.
This dichroic mirror is designed to efficiently reflect 1030 nm laser light while transmitting 940 nm, enabling accurate wavelength separation and
Why are IBS coatings beneficial for this mirror?
Ion Beam Sputtering produces dense, low-defect dielectric coatings with excellent environmental stability, high laser damage resistance, and long-term optical performance, making them ideal for demanding industrial and scientific applications.
Which laser systems can use this dichroic mirror?
The mirror is well suited for Yb-based femtosecond and picosecond laser platforms operating around 1030 nm, including research, industrial processing, and OEM laser systems that require efficient wavelength separation.
What substrate material is used in this optic?
The mirror is manufactured from high-quality UV fused silica, providing excellent optical transmission, thermal stability, and durability for high-power laser applications.
Why is high surface flatness important in ultrafast laser optics?
High surface flatness minimizes wavefront distortion, helping preserve beam quality, maintain precise alignment, and improve the overall performance of high-power ultrafast laser systems.

Got more questions? Use the inquiry form to ask the supplier directly.

Similar Products

Add to Cart