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Description

The OPTOMAN PP-UVFS-12.7-3.0-DM438-AR804EL is a premium non-degrading dichroic mirror designed for demanding Yb:YAG ultrafast laser applications. Manufactured on a UV-grade fused silica (UVFS) substrate with advanced Ion Beam Sputtering (IBS) coatings, this wavelength separator provides exceptional optical stability, high laser damage resistance, and long-term performance under continuous high-power femtosecond laser operation.

Optimized for a 45° angle of incidence, the mirror delivers greater than 99.6% reflectance at 337–349 nm while transmitting 515 nm and 1030 nm with greater than 98% efficiency. Its non-degrading coating technology prevents the color-change effects commonly seen in conventional UV optics, extending operational lifetime beyond 10,000 hours while minimizing maintenance and system downtime.

Featuring λ/10 surface flatness, excellent transmitted wavefront quality, and precision UV fused silica construction, the PP-UVFS-12.7-3.0-DM438-AR804EL is an ideal choice for industrial micromachining, harmonic separation, scientific research, and high-energy ultrafast laser systems.

PP-UVFS-12.7-3.0-DM438-AR804EL Non-Degrading UVFS Dichroic Mirror for 343 nm Yb:YAG Ultrafast Lasers

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Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 12.7 mm
Thickness: 3 mm
Clear Aperture (CA): 80 %
Optimized AOI: 45 – 45 deg
High Reflection Wavelength: 337 – 349 nm
High Transmission Wavelength: 1015 – 1045 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 99.6 – 99.6 %
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): 10-5
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/10
Manufacturer Part Number (MPN): PP-UVFS-12.7-3.0-DM438-AR804EL
FindLight SKU: FL-24655

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-12.7-3.0-DM438-AR804EL
  • Non-degrading IBS coating technology eliminates UV color-change effects for exceptional long-term stability.
  • High reflectance (>99.6%) at 337–349 nm with high transmission (>98%) at 515 nm and 1030 nm.
  • Optimized for 45° angle of incidence in third-harmonic Yb:YAG laser systems.
  • UV-grade fused silica (Corning 7980 0F) substrate for superior optical quality.
  • High laser-induced damage threshold suitable for ultrafast laser pulses.
  • λ/10 surface flatness and transmitted wavefront distortion below λ/10 over the clear aperture.
  • Precision 12.7 mm diameter and 3 mm thickness for easy integration into OEM laser systems.
  • Ideal for continuous high-average-power and high-repetition-rate femtosecond laser operation.
  • Extended service life exceeding 10,000 operating hours helps reduce maintenance costs and downtime.

Applications

  • Third-harmonic (343 nm) wavelength separation in Yb:YAG ultrafast laser systems
  • Industrial femtosecond laser micromachining
  • Precision laser materials processing
  • Semiconductor and electronics manufacturing
  • Medical laser systems
  • Scientific laser laboratories
  • Nonlinear optics and harmonic generation
  • Laser beam routing and wavelength management
  • Ultrafast spectroscopy
  • OEM laser system integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

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Frequently Asked Questions

What is the PP-UVFS-12.7-3.0-DM438-AR804EL designed for?
This dichroic mirror is designed to efficiently separate the third harmonic (343 nm) from the residual 515 nm and 1030 nm beams in Yb:YAG ultrafast laser systems, making it ideal for harmonic generation and precision laser processing.
What makes the non-degrading coating different from conventional UV coatings?
The proprietary non-degrading IBS coating resists the color-change effects that often occur under prolonged UV laser exposure, maintaining consistent optical performance for more than 10,000 operating hours while reducing maintenance requirements.
Which laser systems is this mirror compatible with?
The mirror is suitable for many Yb:YAG ultrafast laser platforms, including systems used for femtosecond micromachining, scientific research, and industrial laser processing that operate with 343 nm, 515 nm, and 1030 nm wavelengths.
Is this mirror suitable for high-power femtosecond lasers?
Yes. The mirror is specifically engineered for high-average-power and high-repetition-rate ultrafast laser applications, featuring a high laser-induced damage threshold and excellent wavefront preservation.
Why is UV fused silica used as the substrate?
UV fused silica offers outstanding transmission, excellent thermal stability, low optical absorption, and superior resistance to high-energy ultraviolet laser radiation, making it an ideal material for precision ultrafast laser optics.

Got more questions? Use the inquiry form to ask the supplier directly.

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