Description

The OPTOMAN PP-UVFS-12.7-3.0-DM255-AR20 is a premium ultrafast dichroic mirror engineered for efficient wavelength separation in femtosecond and picosecond laser systems. Manufactured on a UV fused silica substrate using advanced Ion Beam Sputtering (IBS) coating technology, this optical component delivers exceptional durability, low optical losses, and minimal group delay dispersion to preserve ultrashort pulse characteristics.

Optimized for a 45Β° angle of incidence, it reflects 515 nm with greater than 99.9% efficiency while transmitting 1030 nm with extremely low losses, making it an ideal harmonic separator for Yb:YAG laser platforms and other high-power ultrafast applications. Its precision-polished surfaces, excellent flatness, and high laser damage threshold ensure reliable performance in demanding industrial, scientific, and research environments.

PP-UVFS-12.7-3.0-DM255-AR20 Ultrafast Dichroic Mirror for 515 nm Reflection and 1030 nm Transmission

Specifications

Substrate Material: UV-grade Fused Silica (UVFS)
Shape: Circular
Diameter: 12.7 mm
Thickness: 3 mm
Clear Aperture (CA): 80 %
Optimized AOI: 45 – 45 deg
High Reflection Wavelength: 515 – 515 nm
High Transmission Wavelength: 1030 – 1030 nm
Reflectance, S1 (@ HR Wavelength, @ AOI): 99.9 – 99.9 %
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Commercial Polish
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): <= Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): <= Lambda/8
Manufacturer Part Number (MPN): PP-UVFS-12.7-3.0-DM255-AR20
FindLight SKU: FL-24645

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-12.7-3.0-DM255-AR20
  • Optimized for ultrafast Yb:YAG laser systems operating at 1030 nm and 515 nm
  • Reflects >99.9% at 515 nm while transmitting 1030 nm at 45Β° angle of incidence
  • IBS dielectric coating provides excellent environmental stability and long-term performance
  • Designed for minimal group delay dispersion to preserve femtosecond and picosecond pulse duration
  • High laser damage threshold suitable for high-peak-power laser applications
  • UV fused silica substrate with excellent optical quality
  • Surface quality: 10-5 Scratch-Dig (MIL-PRF-13830B)
  • Surface flatness better than Ξ»/8 @ 633 nm
  • Compact 12.7 mm diameter Γ— 3.0 mm thickness for easy integration into optical systems

Applications

  • Harmonic separation in Yb:YAG ultrafast laser systems
  • Second harmonic generation (SHG) beam routing
  • Femtosecond and picosecond laser beam delivery
  • Pump-probe spectroscopy setups
  • Ultrafast laser amplifiers and regenerative amplifiers
  • Optical parametric amplifier (OPA) systems
  • Precision laser micromachining
  • Nonlinear optics research
  • Scientific laser laboratories● Industrial high-power laser beam management

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) β†’

Frequently Asked Questions

What is the primary function of the PP-UVFS-12.7-3.0-DM255-AR20?
This dichroic mirror separates the first and second harmonics of Yb:YAG lasers by reflecting 515 nm light while transmitting 1030 nm light, enabling efficient wavelength management in ultrafast laser systems.
Why is IBS coating beneficial for this optic?
Ion Beam Sputtering creates dense, highly stable dielectric coatings with extremely low absorption, excellent environmental durability, consistent optical performance, and a high laser damage threshold.
Can this mirror be used with femtosecond lasers?
Yes. It is specifically designed for femtosecond and picosecond laser applications, featuring low group delay dispersion to help preserve ultrashort pulse duration and beam quality.
What angle of incidence is the mirror designed for?
The optical coating is optimized for operation at a 45Β° angle of incidence, where it achieves the specified reflection and transmission performance.
Which applications benefit most from this dichroic mirror?
The mirror is ideal for harmonic beam separation, nonlinear optics, pump-probe experiments, ultrafast laser amplifiers, precision laser processing, and scientific research requiring efficient wavelength discrimination.

Got more questions? Use the inquiry form to ask the supplier directly.

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