Quantum X Two-Photon Grayscale Lithography
Description
The brand-new Nanoscribe Quantum X system is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements.
The world’s first Two-Photon Grayscale Lithography (2GL ®) system combines the extraordinary performance of grayscale lithography with the precision and flexibility of Nanoscribe’s pioneering Two-Photon Polymerization technology. Quantum X offers high speed, full design freedom and the precision needed for additive fabrication of complex structures requiring high shape accuracy and ultra-smooth surfaces. Fast and accurate additive manufacturing processes drastically shorten design iteration cycles and enable cost-effective microfabrication.
Quantum X Two-Photon Grayscale Lithography
Specifications |
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|---|---|
| Printing Technology: | Grayscale Lithography, Two-Photon Grayscale Lithography |
| Min XY Feature Size: | 160 nm |
| Min Vertical Step: | 10 nm |
| Min Surface Roughness: | 10 nm |
| Area Printing Speed: | 3 mm^2/h |
Features
- High-speed 2.5D microfabrication
- Ultra-smooth surfaces and excellent shape accuracy
- Design freedom with sub-micrometer resolution
- Complete and ultrafast control over voxel size
- Automated processes, e.g., calibration, job execution and monitoring
- Wide choice of substrate–resin combinations
- Continuous execution of various print jobs by job queue
- Touchscreen and remote-control interfaces
Applications
- Refractive microoptics – individual lenses and arrays
- Multi-level diffractive optical elements – up to 256 discrete or quasi-continuous levels
- Rapid prototyping of 2.5D microoptics
- Rapid tooling with patterned polymer masters for replication processes
- Small series production
- Wafer scale fabrication
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
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How to order?
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Ships from:
Germany
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Sold by:
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On FindLight:
External Vendor
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Frequently Asked Questions
The Quantum X system controls the voxel size along one scanning plane using synchronized laser power modulation at high speeds. In this manner, complex shapes are produced and variable feature heights are achievable within one scan field.
The Quantum X system can be used for refractive microoptics, multi-level diffractive optical elements, rapid prototyping of 2.5D microoptics, rapid tooling with patterned polymer masters for replication processes, small series production, and wafer scale fabrication.
The Quantum X system offers high-speed 2.5D microfabrication, ultra-smooth surfaces and excellent shape accuracy, design freedom with sub-micrometer resolution, complete and ultrafast control over voxel size, automated processes, and a wide choice of substrate-resin combinations.
The Nanoscribe Quantum X system is designed for the microfabrication of prototypes and masters in industrial production processes, specifically for the fabrication of free-form microoptics, microlens arrays, and multi-level diffractive optical elements.
Two-Photon Grayscale Lithography (2GL) is a breakthrough technology that combines additive microfabrication with ultra-fast voxel size tuning. It paves the way for ultra-fast, accurate, and free-form microfabrication without compromising speed or accuracy.