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HERCULES Lithography Track System
EV Group (EVG)
Based on a modular platform, the HERCULES combines EVG’s established optical mask alignment technology with integrated wafer cleaning, resist coating, baking and resist development modules. The HERCULES enables cassette-to-cassette processing of various wafer sizes. The HERCULES safely handles thick, highly bowed, rectangular, ...
  • Printing Technology: Grayscale Lithography
  • Min XY Feature Size: 500 nm
  • Min Vertical Step: 1000 nm
  • Min Surface Roughness: 2000 nm
  • Area Printing Speed: -- mm^2/h
Data Sheet
EVG101 Advanced Resist Processing System
EV Group (EVG)
The EVG101 resist processing system performs R&D-type processes on a single chamber design, which is fully compatible with EVG’s automated systems. The EVG101 supports wafers up to 300 mm and can be configured for spin or spray coating and developing. Conformal layers of photoresist or polymers are achieved on 3D structured ...
  • Printing Technology: Grayscale Lithography
  • Min XY Feature Size: -- nm
  • Min Vertical Step: -- nm
  • Min Surface Roughness: -- nm
  • Area Printing Speed: -- mm^2/h
Data Sheet
LITHOSCALE Maskless Exposure Lithography System
EV Group (EVG)
The LITHOSCALE system featuring EV Group’s MLE™ maskless exposure technology tackles legacy bottlenecks by combining powerful digital processing that enables realtime data transfer and immediate exposure, high structuring resolution and throughput scalability. Its mask-free approach eliminates mask-related consumables, ...
  • Printing Technology: Grayscale Lithography
  • Min XY Feature Size: 1000 nm
  • Min Vertical Step: -- nm
  • Min Surface Roughness: -- nm
  • Area Printing Speed: -- mm^2/h
Data Sheet
Quantum X Two-Photon Grayscale Lithography
Nanoscribe GmbH
The brand-new Nanoscribe Quantum X system is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements. The world’s first Two-Photon Grayscale ...
  • Printing Technology: Grayscale Lithography, Two-Photon Grayscale Lithography
  • Min XY Feature Size: 160 nm
  • Min Vertical Step: 10 nm
  • Min Surface Roughness: 10 nm
  • Area Printing Speed: 3 mm^2/h
Data Sheet