FILTER PRODUCTS

to
to
to
to
Quantum X Two-Photon Grayscale Lithography
Nanoscribe GmbH
The brand-new Nanoscribe Quantum X system is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements. The world’s first Two-Photon Grayscale ...
  • Printing Technology: Grayscale Lithography, Two-Photon Grayscale Lithography
  • Min XY Feature Size: 160 nm
  • Min Vertical Step: 10 nm
  • Min Surface Roughness: 10 nm
  • Area Printing Speed: 3 mm^2/h
Data Sheet