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Description

PHASICS Kaleo Kit Modular Metrology Solution from UV to IR

The PHASICS Kaleo Kit is a fully modular optical metrology solution designed for advanced wavefront sensing, optics qualification, and optical system characterization across a broad spectral range from ultraviolet to infrared. Built for laboratories, production teams, and R&D environments working with increasingly complex optical assemblies, the Kaleo Kit enables users to configure a measurement system around their exact requirements, including test wavelength, resolution, sensitivity, sampling, beam size, and optical configuration.

Unlike fixed metrology instruments, the Kaleo Kit is assembled from compatible measurement modules that can be combined to create a compact, cost-effective, and adaptable system. Users can select the appropriate SID4 wavefront sensor, illumination module, beam shaping optics, focusing system, and reference mirror to match the sample under test. This modular architecture makes the system suitable for finite-finite, infinite-finite, and other demanding optical test configurations while allowing the same modules to be reused across multiple setups.

At the core of the Kaleo Kit is PHASICS’ wavefront sensing technology, developed for high-precision phase and aberration measurement. The system provides access to critical optical performance data in a single-shot acquisition, including transmitted wavefront error, reflected wavefront error, wavefront aberrations, modulation transfer function, point spread function, phase maps, and shape error analysis. This makes it especially valuable for teams that need fast, repeatable, and quantitative insight into optical quality during design validation, alignment, prototyping, and final inspection.

The Kaleo Kit supports a wide range of test wavelengths, with standard options spanning UV, visible, near-infrared, short-wave infrared, and deep-wave infrared regions. Compatible sensor options include models optimized for UV, visible/NIR, high-resolution visible/NIR, ultra-high-resolution measurements, SWIR, SWIR high resolution, and DWIR applications. This broad wavelength compatibility allows users to evaluate optics under conditions close to their real operating environment, which is essential for applications involving laser systems, imaging optics, infrared components, astronomical instruments, and precision optical assemblies.

Designed for versatility, the PHASICS Kaleo Kit can be configured for many optical metrology tasks, including telescope alignment and characterization, large-diameter flat optics testing, concave mirror measurement, off-axis lens evaluation, and lens or objective characterization in a variety of geometries. It is also well suited for filters, windows, polarizing optics, spherical mirrors, and complex optical systems that require detailed phase, aberration, MTF, or PSF evaluation.

The modular design also supports practical workflow efficiency. By allowing users to choose only the modules required for a specific test, the Kaleo Kit helps reduce unnecessary system complexity while maintaining the flexibility to expand or reconfigure the setup as measurement needs evolve. Its compact architecture and alignment-oriented design make it accessible for routine measurements while still delivering the precision required for high-end optical metrology.

For organizations seeking a scalable modular wavefront metrology system, the PHASICS Kaleo Kit offers a powerful platform for UV-to-IR optical testing, wavefront analysis, lens characterization, mirror inspection, and optical system alignment. Its combination of configurable hardware, broad spectral coverage, and single-shot measurement capability makes it a strong solution for precision optics manufacturers, photonics laboratories, aerospace and defense programs, laser system developers, and research institutions requiring reliable, high-resolution optical qualification.

PHASICS Kaleo Kit Modular UV to IR Wavefront Metrology System

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Specifications

Interferometer Configuration: Not Specified
Light Source: 543nm, 594nm, 632 nm or 633nm, 1550nm, 1064nm, 1053nm, 780nm, 532nm, 355nm
Output Polarization: Not Specified
RMS Repeatability: Not Specified
RMS Precision: Not Specified
Product: Kaleo Kit
System Type: Fully modular metrology solution
Measurement Spectral Coverage: UV to IR
Illumination Wavelengths: 365, 405, 530, 625, 740, 780, 810, 850, 940, 1050, 1550, 3900 nm
Focusing System F-number Options: F/0.6, F/0.7, F/1.2, F/2, F/3.3, F/5, F/9
Beam Expander Exit Pupil Diameter Options: 8, 15, 30, 60, 100, 130 mm
Reference Mirror Options: Flat or sphere
SID4 UV Spectral Range: 250-400 nm
SID4 UV Sampling: 250 x 250 px
SID4 Spectral Range: 400-1100 nm
SID4 Sampling: 182 x 136 px
SID4 HR Spectral Range: 400-1100 nm
SID4 HR Sampling: 416 x 360 px
SID4 UHR Spectral Range: 400-1100 nm
SID4 UHR Sampling: 512 x 512 px
SID4 SWIR Spectral Range: 900-1700 nm
SID4 SWIR Sampling: 80 x 64 px
SID4 SWIR HR Spectral Range: 900-1700 nm
SID4 SWIR HR Sampling: 160 x 128 px
SID4 DWIR Spectral Range: 3000-5000 nm
SID4 DWIR Sampling: 160 x 120 px
Measurement Outputs: TWE, RWE, wavefront aberrations, MTF, PSF
Measurement Configurations: Finite-finite, infinite-finite

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Features

  • Fully Modular Optical Metrology Platform: The PHASICS Kaleo Kit enables users to assemble a customized metrology system using compatible wavefront sensors, illumination modules, beam expanders, focusing systems, and reference mirrors.
  • Broad UV to IR Wavelength Coverage: Supports metrology from UV to infrared, with standard wavelength options including 365, 405, 530, 625, 740, 780, 810, 850, 940, 1050, 1550, and 3900 nm, with additional wavelengths available upon request.
  • Compatible with Multiple SID4 Wavefront Sensors: Works with PHASICS SID4 sensor models including SID4 UV, SID4, SID4 HR, SID4 UHR, SID4 SWIR, SID4 SWIR HR, and SID4 DWIR, covering spectral ranges from 250 nm to 5000 nm.
  • Single-Shot Wavefront Measurement: Captures critical optical performance data in a single acquisition, including transmitted wavefront error (TWE), reflected wavefront error (RWE), wavefront aberrations, modulation transfer function (MTF), point spread function (PSF), phase maps, and shape error.
  • Designed for Optics Qualification and Characterization: Ideal for measuring and validating optical components and systems throughout development, manufacturing, alignment, and quality control workflows.
  • High-Resolution Phase Measurement: Delivers precise and repeatable wavefront analysis with high spatial resolution, supporting demanding optical metrology applications that require detailed aberration mapping.
  • Nanometric Sensitivity: Provides extremely sensitive phase and wavefront measurements, making it suitable for advanced optical testing where small surface or wavefront deviations must be detected.
  • Measures Large Aberrations: PHASICS wavefront sensing technology is well suited for the measurement of large optical aberrations, supporting complex optical systems and non-ideal samples.
  • Achromatic Measurement Capability: Designed for measurement at virtually any test wavelength, enabling flexible use across broadband and wavelength-specific optical metrology setups.
  • Multiple Measurement Configurations: Supports a wide range of optical testing layouts, including finite-finite, infinite-finite, reflected, transmitted, collimated, and focused beam configurations.
  • Interchangeable Illumination Modules: Select the illumination wavelength that best matches the optical component or system under test, allowing the same platform to be adapted to many measurement requirements.
  • Flexible Beam Shaping Options: Compatible with beam expanders offering exit pupil diameters such as 8 mm, 15 mm, 30 mm, 60 mm, 100 mm, and 130 mm, enabling characterization of small to large aperture optics.
  • Focusing System Options: Supports focusing modules with F-number options including F/0.6, F/0.7, F/1.2, F/2, F/3.3, F/5, and F/9, allowing adaptation to diverse optical designs and numerical aperture requirements.
  • Reference Mirror Compatibility: Can be configured with flat or spherical reference mirrors for reflected wavefront error measurements and surface characterization.
  • Compact and Cost-Effective System Design: The modular architecture allows users to purchase only the modules required for their application while retaining the ability to expand or reconfigure the system later.
  • Easy Alignment and Operation: Engineered for straightforward setup, alignment, and data acquisition, reducing operator training time and improving measurement efficiency.
  • Quick Access to Optical Performance Results: Provides rapid visualization and analysis of key results such as MTF curves in X and Y, diffraction limit comparison, phase maps, RMS aberration values, curvature radius, focal length, and sag measurements.
  • Supports Stand-Alone Module Use: Individual modules can be used independently or integrated into different Kaleo Kit configurations, increasing laboratory flexibility and return on investment.
  • Adaptable for Research, Production, and Quality Control: Suitable for R&D labs, optical manufacturing, incoming inspection, production metrology, and system integration environments.
  • Ideal for Telescope Alignment and Characterization: Enables accurate wavefront testing and alignment of telescope optics, mirrors, and large-aperture optical systems.
  • Large Diameter Flat Optics Testing: Designed for the characterization of filters, windows, polarizing optics,

Applications

Applications of the PHASICS Kaleo Kit Modular Metrology System

  • Optical system alignment and qualification: Ideal for precise alignment, characterization, and validation of complex optical assemblies from UV to IR wavelengths.
  • Telescope alignment and characterization: Used for testing and optimizing telescope optics, including wavefront error, aberrations, point spread function, and imaging performance.
  • Large-diameter flat optics testing: Suitable for quality control of optical flats, windows, filters, polarizers, beam splitters, and other large-aperture flat optical components.
  • Concave mirror measurement: Enables accurate metrology of spherical and concave mirrors, including radius of curvature, shape error, surface quality, and transmitted or reflected wavefront error.
  • Off-axis lens characterization: Supports measurement of off-axis lenses and non-standard optical geometries where conventional metrology setups may be difficult to align.
  • Large-diameter lens and objective testing: Designed for the characterization of large lenses, objectives, and optical systems in finite-finite, infinite-finite, and other measurement configurations.
  • Wavefront error measurement: Provides single-shot measurement of transmitted wavefront error, reflected wavefront error, optical aberrations, and phase maps with nanometric sensitivity.
  • MTF and imaging performance analysis: Used to evaluate modulation transfer function, point spread function, diffraction-limited performance, and overall image quality of optical systems.
  • UV, visible, SWIR, and IR optics metrology: Supports optical testing across a broad wavelength range, including UV, visible, near-infrared, SWIR, and mid-infrared applications.
  • Lens manufacturing quality control: Suitable for production and R&D environments requiring fast, repeatable inspection of lenses, lens groups, objectives, and optical assemblies.
  • Laser optics characterization: Enables qualification of laser-grade mirrors, lenses, windows, beam expanders, and focusing optics by measuring wavefront distortion and optical quality.
  • Beam expander and focusing system testing: Used to validate optical performance of beam expansion modules, focusing systems, and custom beam-shaping assemblies.
  • High-aberration optics measurement: Well suited for measuring optical components and systems with large aberrations, where high dynamic range wavefront sensing is required.
  • Achromatic wavefront metrology: Supports measurements at multiple test wavelengths, making it useful for broadband, multispectral, and chromatic optical system evaluation.
  • Infrared optical component testing: Applicable to SWIR and MWIR optical systems, including IR lenses, thermal imaging optics, infrared windows, and specialty IR coatings.
  • UV optical component inspection: Suitable for UV-grade optics, lithography-related components, UV lenses, mirrors, windows, and coatings requiring precise wavefront measurement.
  • Adaptive optics development: Useful for the characterization, calibration, and optimization of adaptive optics systems, deformable mirrors, and wavefront correction modules.
  • Freeform and aspheric optics testing: Supports metrology of advanced optical surfaces, including aspheres, freeform optics, and complex components used in modern imaging systems.
  • Optical coating and filter evaluation: Helps assess the impact of coatings, filters, and polarizing optics on transmitted or reflected wavefront quality.
  • Scientific instrumentation development: Used in laboratories and R&D facilities for the development and validation of high-performance optical instruments.
  • Aerospace and defense optics testing: Suitable for qualification of optical systems used in telescopes, targeting systems, surveillance optics, space instruments, and infrared imaging platforms.
  • Semiconductor and lithography optics metrology: Applicable to high-precision UV and visible optical systems used in inspection, lithography, wafer metrology, and advanced manufacturing.
  • Microscopy objective characterization: Enables testing of microscope objectives and imaging optics for aberrations, MTF, PSF, and alignment quality.
  • Camera lens and imaging module validation: Supports performance verification of precision camera lenses, imaging modules, and optical sensors in research, prototyping, and production.
  • Optical prototyping and R&am

Frequently Asked Questions

What is the PHASICS Kaleo Kit modular optical metrology system?
The PHASICS Kaleo Kit is a fully modular wavefront and optics qualification system designed for UV to IR metrology. It combines compatible modules such as SID4 wavefront sensors, illumination sources, beam expanders, focusing systems, and reference mirrors to build a compact measurement setup tailored to a specific wavelength, sample size, resolution, and optical configuration.
What wavelengths and spectral ranges does the Kaleo Kit support?
The Kaleo Kit supports measurements from UV to IR, with SID4 sensor options covering approximately 250–400 nm, 400–1100 nm, 900–1700 nm, and 3000–5000 nm. Standard illumination wavelengths include 365, 405, 530, 625, 740, 780, 810, 850, 940, 1050, 1550, and 3900 nm, with additional wavelength options available on request.
What optical parameters can be measured with the PHASICS Kaleo Kit?
The Kaleo Kit can provide single-shot access to key optical metrology results including transmitted wavefront error, reflected wavefront error, wavefront aberrations, phase maps, MTF, PSF, and shape error. It is suitable for measuring lenses, objectives, mirrors, windows, filters, polarizers, and other optical components.
How do I configure a Kaleo Kit metrology setup?
A Kaleo Kit setup is configured in three main steps: choose the appropriate SID4 wavefront sensor for the spectral range and sampling resolution, select the illumination module for the required test wavelength, and shape the beam using either a focusing system or beam expander. Optional reference mirrors, including flat or spherical references, can be added depending on the measurement configuration.
What applications is the Kaleo Kit best suited for?
The PHASICS Kaleo Kit is designed for telescope alignment and characterization, large-diameter flat optics inspection, concave mirror measurement, off-axis lens testing, and characterization of large lenses and objectives. It supports multiple optical configurations, including finite-finite and infinite-finite setups, making it useful from R&D through production quality control.
How does the Kaleo Kit compare with traditional interferometers or Shack-Hartmann wavefront sensors?
Compared with many traditional metrology tools, the Kaleo Kit is optimized for modularity, wavelength flexibility, compact alignment, and large-aberration measurement. PHASICS SID4 wavefront sensors are based on achromatic wavefront sensing technology, allowing measurements at many test wavelengths while providing high resolution and nanometric sensitivity.
Can Kaleo Kit modules be reused in different optical test setups?
Yes. Kaleo Kit modules are designed to be compatible across different configurations and can also be used in stand-alone setups. The same wavefront sensor, illumination, beam shaping, and reference modules can be reconfigured for different samples, wavelengths, pupil sizes, and optical layouts, helping reduce the cost and footprint of a complete metrology lab.

Got more questions? Use the inquiry form to ask the supplier directly.

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