Advanced Radiation Corp
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Frequently Asked Questions

The purpose of these lamps is to serve as high intensity sources for short wavelength ultraviolet photoresist exposure in photolithography.

Deep ultraviolet radiation is produced by a mercury-xenon plasma.

Careful control of plasma constituents ensures maximum conversion of input power to output radiation.

The research and development for these DUV lamps has been conducted for more than three years.

These lamps are ideally suited for PMMA (210-260 nm), AZ2400 Series (240-310 nm), and ODVR Series (200-315 nm) photoresist formulations.

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