Frequently Asked Questions

Laser skiving uses energy over time to etch a material in a controlled order of energy delivery across the material surface, creating a uniformed visual effect and significantly less variation in surface topography when depth control is desired.

Laser skiving can be used for cavity formation, floating contacts (fingers), squeeze-out removal, dry film or polyimide removal, circuit formation and isolation, buried wirebond pads, and selective soldermask removal.

The positional and dimensional tolerances of laser service are +/- .002" (50um) for infrared (CO2) and +/- .001" (25um) for ultraviolet (UV).

Control depth skiving allows for a stopping depth in the same material by removing one thin layer of material at a time without cutting through the material.

Laser skiving is a selective ablation process that can remove one material with or without affecting an underlying material.

You May Also Like