The PP-UVFS-50.8-8.0-DM77-AR120 is a precision ultrafast dichroic mirror (harmonic separator) designed to efficiently separate the 515 nm second harmonic from the 1030 nm fundamental wavelength in Yb-based femtosecond and picosecond laser systems. Fabricated on a 50.8 mm UV fused silica substrate with 8.0 mm thickness, this optic utilizes ion beam sputtered (IBS) dielectric coatings to deliver exceptional spectral performance, high laser damage resistance, and excellent long-term environmental stability. It is optimized for operation at a 45° angle of incidence, providing greater than 99.5% reflectivity at 515 nm while maintaining less than 5% reflection at 1030 nm, enabling efficient wavelength separation with minimal optical losses.

Designed specifically for high-power ultrafast laser systems, the mirror preserves pulse quality through its low absorption and low dispersion coating design while supporting reliable operation under high peak intensities. The UV fused silica substrate offers excellent thermal stability, high optical homogeneity, and low bulk absorption, making the optic well suited for demanding industrial, scientific, and OEM photonics applications. Whether integrated into harmonic generation stages, beam routing assemblies, or advanced laser processing equipment, the PP-UVFS-50.8-8.0-DM77-AR120 provides precise spectral separation and dependable optical