Description

The OPTOMAN PP-UVFS-25.4-3.0-NPBS10 is a premium non-polarizing beam splitter engineered for precision laser systems operating at 1064 nm. Manufactured from high-quality UV fused silica and coated using advanced Ion Beam Sputtering (IBS) technology, this optic delivers a highly accurate 50/50 reflection/transmission ratio (±0.5%) at a 6° angle of incidence while preserving the polarization state of the incident beam.

Its excellent optical quality, low-loss performance, and high laser damage resistance make it an ideal choice for demanding Nd:YAG laser applications, industrial laser processing, scientific instrumentation, and precision optical setups.

PP-UVFS-25.4-3.0-NPBS10 1064 nm Non-Polarizing Beam Splitter

Specifications

Substrate: UV Fused Silica (UVFS)
Largest Dimension: 25.4 mm
Thickness: 3 mm
Wavelength Range: 1064 – 1064 nm
Beamsplitter Type: Non-Polarizing
Angle Of Incidence (AOI): 6 – 6 deg
Surface Quality, S1/S2 (scratch-dig): 20-10
Surface Flatness, S1 (@ 633nm, Over CA Or Per Manufacturer): <= Lambda/4
Transmitted Wavefront Distortion (TWD) @ 633nm Over CA: Unspecified
Reflectance Ra, S1 (@ AOI, @ Peak Wavelength): 50 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-3.0-NPBS10
FindLight SKU: FL-24678

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-3.0-NPBS10
  • Optimized for 1064 nm Nd:YAG laser wavelength
  • Precise 50/50 transmission and reflection balance (±0.5%)
  • Non-polarizing design minimizes polarization-dependent losses
  • Advanced Ion Beam Sputtering (IBS) coatings for exceptional durability
  • UV fused silica substrate for excellent optical transmission and thermal stability
  • 25.4 mm diameter with 3.0 mm thickness
  • 20 mm minimum clear aperture for efficient beam utilization
  • Surface quality: 20-10 Scratch-Dig
  • Surface flatness: < λ/4 @ 633 nm
  • Parallelism better than 5 arcmin
  • Designed for 6° angle of incidence
  • High laser-induced damage threshold suitable for demanding laser environments

Applications

  • Nd:YAG laser systems operating at 1064 nm
  • Industrial laser material processing
  • Laser beam sampling and monitoring
  • Optical power measurement systems
  • Precision interferometry
  • Scientific and laboratory optical experiments
  • Laser diagnostics and alignment
  • Optical metrology equipment
  • Research and development laser platforms
  • OEM photonics and laser integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary purpose of the PP-UVFS-25.4-3.0-NPBS10 beam splitter?
This optic is designed to divide a 1064 nm laser beam into nearly equal reflected and transmitted beams while maintaining minimal polarization dependence, making it ideal for precision laser systems.
Why is Ion Beam Sputtering (IBS) coating beneficial?
IBS coatings provide exceptional coating density, low optical losses, high environmental stability, and excellent laser damage resistance, ensuring consistent performance over long operating periods.
Which laser systems is this beam splitter compatible with?
It is optimized for 1064 nm Nd:YAG laser systems and is well suited for beam delivery, diagnostics, laser processing equipment, and scientific optical instruments requiring accurate 50/50 beam splitting.
What optical substrate is used in this component? durability in high-power laser applications.
The beam splitter is manufactured from UV fused silica, a material valued for its outstanding optical clarity, low thermal expansion, and excellent
Can this beam splitter be used in demanding industrial environments?
Yes. Its IBS-coated surfaces, high optical quality, and robust UV fused silica substrate make it suitable for industrial laser systems, research laboratories, OEM integration, and other applications requiring reliable long-term optical performance.

Got more questions? Use the inquiry form to ask the supplier directly.

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