All Categories

FILTER PRODUCTS

to
to
to
  1. Home
  2. Material Production
  3. Coating
  4. Thin Film Deposition
  5. Chemical Vapor Deposition (CVD)

Chemical Vapor Deposition (CVD) Thin Film Deposition

EPEE 550 PECVD Plasma Enhanced CVD For LED Technology
Akrion Systems LLC
Add to watch list
EPEE 550 PECVD Plasma Enhanced CVD For LED Technology
As LEDs get smaller and films get thinner, LED manufacturers need production-worthy process solutions for the high-speed deposition of uniform SiO2 (silicon dioxide), SiNx (silicon nitride) and SiOxNx (silicon oxynitride) films. NAURA Akrion’s EPEE 550 PECVD (plasma enhanced chemical vapor deposition) product offers LED ...

Specifications
Substrate Size: 1-1mm
Base Vacuum: -- Torr
Max Substrate Temperature: -- degC
Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
OCTOS 6 Automated Thin Film Deposition Cluster Tool
Kurt J Lesker Co
Add to watch list
OCTOS 6 Automated Thin Film Deposition Cluster Tool
The Kurt J. Lesker Company® OCTOS cluster tools are proven R&D and pilot production systems for in vacuum transfer between multiple process chambers. Typical applications include Magnetic Tunnel Junctions and Spin Logic devices (GMR, TMR, MRAM, STT), Organic Light Emitting Devices (OLED), Solar Cells (PV, OPV). The OCTOS cluster ...

Specifications
Substrate Size: 150-150mm
Base Vacuum: -- Torr
Max Substrate Temperature: -- degC
Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
ALD-150LX Atomic Layer Deposition System
Kurt J Lesker Co
Add to watch list
ALD-150LX Atomic Layer Deposition System
The Kurt J. Lesker Company® (KJLC®) ALD150LX™ is an Atomic Layer Deposition (ALD) system designed specifically for advanced research and development (R&D) applications. Innovative ALD150LX™ design features, like our Patented Precursor Focusing Technology™, blended with advanced process capability provide ...

Specifications
Substrate Size: 150-150mm
Base Vacuum: -- Torr
Max Substrate Temperature: 500 degC
Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
PRO Line PVD 75 Thin Film Deposition System
Kurt J Lesker Co
Add to watch list
PRO Line PVD 75 Thin Film Deposition System
The Kurt J. Lesker Company® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a proven, robust, and versatile design. The PRO Line PVD 75 builds on the successes of the original design with improved system base ...

Specifications
Substrate Size: 150-150mm
Base Vacuum: 1500 Torr
Max Substrate Temperature: 850 degC
Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
On FindLight marketplace you will find 4 different Chemical Vapor Deposition (CVD) Thin Film Deposition from suppliers around the world. With just a few clicks you can compare different Chemical Vapor Deposition (CVD) Thin Film Deposition and get accurate price quotes based on your needs and quantity required. Note that some wholesale suppliers may offer discounts for large quantities. From any product page you can directly contact any vendor within seconds.