SQ Fused Silica – Ultrapure Fused Silica -SQ-E193

Specifications

Transmission At 193 Nm: Excellent
Transmission At 248 Nm: Excellent
Typical Transmission Path Length: 10 mm
Excimer Grade: SQ1 or SQ0
Fluorescence Signal: Very low level
Substrate Material: Fused Silica
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Features


  • High Laser Durability: SQ Fused Silica is designed to withstand intense laser applications, making it ideal for optical and photonic devices.

  • Refractive Index Homogeneity: Ensures consistent optical performance across various applications, from fiber optics to semiconductor technologies.

  • Thermal Stability: Exceptional resistance to temperature shocks and thermal expansion, providing reliability in demanding environments.

  • Low Stress Birefringence: Minimizes optical distortion, crucial for precision applications in optics and photonics.

  • Minimal Thermal Expansion: Features small thermal expansion coefficients, enhancing stability and performance under thermal stress.

  • High UV and Laser Radiation Stability: Due to high OH and H2 content, the material exhibits low fluorescence and high stability under UV and laser exposure.

  • Versatile Applications: Suitable for excimer laser optics, DUV and UV optical components, standard optics (VIS and NIR), UV rods, preforms, optical fibers, and more.

  • Available in Various Quality Grades: Offered in five quality grades (SQ0, SQ1, SQT, SQ0-E193, SQ1-E193, SQ0-E248, SQ1-E248) tailored to specific customer needs and applications.

  • Excellent Transmission: Excimergrade Fused Silica provides outstanding transmission at 193 nm and 248 nm, with minimal laser-induced fluorescence.

  • Customizable Formats: Available as ingots or semi-finished products (discs, rods, plates, blocks), allowing for customization based on project requirements.

Applications


  • Excimer Laser Optics: Ideal for beam guiding systems and excimer-grade components.

  • DUV and UV Optics: High transmission fused silica for deep ultraviolet applications.

  • VIS and NIR Standard Optics: Suitable for lenses, wafers, rods, and fibers.

  • Lithography & Microlithography: Stepper lenses, photo mask blanks, and optics.

  • Laser Fusion Systems: High stability under intense laser radiation.

  • Technical Components: Windows, vessels, and precision optical parts.