Description
Introducing our Precision Air Slit, a meticulously crafted component designed to meet the highest standards of precision and reliability. This air slit is engineered with a width of 25 µm, ensuring exceptional accuracy for a variety of optical applications. Its compact yet robust design makes it an ideal choice for professionals seeking precision in their optical setups.
The slit extends to a length of 12 mm, providing ample coverage for diverse experimental and industrial needs. Its substrate, with a diameter of 25.4 mm, is crafted from high-quality stainless steel, offering durability and resistance to environmental factors. This ensures that the product maintains its integrity and performance over time, even under demanding conditions.
With a substrate thickness of just 0.05 mm, this precision air slit is designed to integrate seamlessly into compact systems without compromising on strength or stability. The use of stainless steel not only enhances its durability but also ensures that it remains lightweight and easy to handle. This combination of features makes it an indispensable tool for those who require precision and reliability in their optical components.
Precision Air Slit - 25um / 12mm
Specifications
Slit Width: | 25 um |
---|---|
Slit Length: | 12 mm |
Mounting: | Unmounted |
Part Diameter: | 25.4 mm |
Thickness: | 0.05 mm |
Features
- Precision Air Slit: Designed for high-precision applications requiring exact slit dimensions.
- Width: 25 µm - Ensures precise control over light passage for accurate measurements.
- Length: 12 mm - Suitable for various optical setups and configurations.
- Substrate Diameter: 25.4 mm - Standard size for compatibility with a wide range of optical instruments.
- Substrate Thickness: 0.05 mm - Ultra-thin design for minimal interference in optical paths.
- Substrate Material: Stainless Steel - Durable and resistant to corrosion, ensuring long-lasting performance.
Applications
- Optical Spectroscopy: Ideal for use in spectrometers to ensure precise light measurement and analysis.
- Laser Systems: Suitable for laser applications requiring precise beam shaping and control.
- Microscopy: Enhances imaging quality by providing accurate light control in advanced microscopy techniques.
- Photolithography: Used in semiconductor manufacturing for precise patterning of materials.
- Scientific Research: Essential for experiments requiring high precision in light manipulation and measurement.
- Optical Calibration: Used in calibrating optical instruments to ensure accuracy and reliability.
Frequently Asked Questions
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