Description

The OPTOMAN PP-UVFS-25.4-6.35-LLM302 is a premium ion beam sputtered (IBS) chirped mirror engineered for precise dispersion management in ultrafast laser systems operating at the second harmonic of Yb:YAG lasers (515 nm). Designed to introduce -200 fs² Group Delay Dispersion (GDD) per reflection over the 505–525 nm wavelength range at a 45° angle of incidence, this mirror enables efficient pulse compression while maintaining exceptional reflectivity and low optical losses.

Manufactured on a high-quality UV fused silica (UVFS) substrate, the mirror combines outstanding optical performance with excellent environmental stability and a high laser-induced damage threshold. Unlike prism or grating compressors, this compact dispersive mirror simplifies optical layouts while providing stable, alignment-insensitive pulse compression for demanding femtosecond laser applications.

PP-UVFS-25.4-6.35-LLM302 Chirped Mirror for 515 nm Ultrafast Lasers

Specifications

Substrate Material: UVFS
Diameter: 25.4 mm
Thickness: 6.35 mm
Clear Aperture (CA): 80 %
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Unspecified
Surface Flatness, S1 (@ 633nm Over CA Or Per Manufacturer): Other
Wedge, S1: 3 arcmin
Optimized AOI: 45 – 45 deg
Average Reflectance (@ Peak Wavelength Range, Optimized AOI): 99.9 %
Average GDD (@ Peak Wavelength Range, Optimized AOI): 200 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-LLM302
FindLight SKU: FL-24579

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-LLM302
  • IBS dielectric coating for exceptional durability, low absorption, and minimal scattering
  • Optimized for 505–525 nm wavelength range at 45° AOI
  • Provides -200 fs² ±100 fs² Group Delay Dispersion (GDD) per reflection
  • High reflectivity exceeding 99.9% across the specified operating range
  • UV fused silica substrate (25.4 mm diameter × 6.35 mm thickness)
  • Surface quality: 20-10 Scratch-Dig (MIL-PRF-13830B)
  • Clear aperture greater than 80%
  • Laser damage threshold optimized for 250 µJ, 25 fs pulses with beam diameters below 10 mm
  • Ideal for compact pulse compression systems without prisms or diffraction gratings

Applications

  • Pulse compression in femtosecond laser systems
  • Dispersion compensation for ultrafast amplifiers
  • Yb:YAG second harmonic (515 nm) laser setups
  • Ultrafast spectroscopy
  • Nonlinear microscopy and imaging
  • Precision micromachining with femtosecond lasers
  • Pump-probe experiments
  • Optical research laboratories and laser development platforms

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary purpose of the PP-UVFS-25.4-6.35-LLM302 mirror?
This chirped mirror compensates for positive dispersion in ultrafast laser systems by introducing negative Group Delay Dispersion (-200 fs² per reflection), helping maintain extremely short pulse durations.
Which laser wavelength is this mirror designed for?
It is optimized for operation between 505 nm and 525 nm, making it ideal for the second harmonic (515 nm) output of Yb:YAG ultrafast laser systems.
Why is IBS coating beneficial?
Ion Beam Sputtering produces dense, highly durable dielectric coatings with excellent optical stability, very low absorption, minimal scattering, and high resistance to laser-induced damage, resulting in long service life and consistent optical performance.
Can this mirror replace prism or grating pulse compressors?
In many ultrafast laser systems, chirped mirrors provide a more compact, alignment-friendly solution for pulse compression while reducing system complexity and minimizing optical losses.
What research and industrial applications benefit from this mirror?
The mirror is widely used in femtosecond laser research, nonlinear optics, spectroscopy, biomedical imaging, ultrafast material processing, and precision scientific instrumentation where accurate dispersion control is essential.

Got more questions? Use the inquiry form to ask the supplier directly.

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