Pulse Compression Grating

Specifications

Groove Density: 3039.5 l/mm
Center Wavelength: 450 nm
Material: Fused silica and high-power, dielectric AR coating materials
Grating Area: 20 mm x 20 mm
Substrate Size: 22 mm x 22 mm x 1 mm
Dispersion At 450 Nm: 0.24 deg/nm
Nominal Wavelength: 450 nm
Angle Of Incidence (AOI): Littrow (43 deg)
Diffraction Efficiency (TE): >92%
Back-side AR Coating: High power, dielectric AR coating applied
Production Technology: 2-beam Interferometry and Reactive Ion Etch, Class 10 cleanroom environment
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Features


  • Unbeatable Energy/Power Damage Threshold: Designed to handle high energy levels, perfect for advanced femtosecond laser systems.

  • High-Efficiency Spectral Performance: Offers high diffraction efficiency for optimal performance.

  • Environmentally and Thermally Stable: Ensures consistent performance under varying environmental conditions.

  • Low Wavefront Distortion: Maintains high optical quality with minimal distortion.

  • High Tolerance to Incidence Angle: Flexible design accommodates various angles of incidence. Back-side AR Coating: High power, dielectric AR coating applied

  • Manufacturing Excellence: Produced using advanced interferometric patterning and reactive ion etching technologies in a Class 10 cleanroom environment.

  • Custom/OEM Availability: While custom options are available, many gratings are also in stock for immediate delivery.

Applications


  • Femtosecond Laser Pulse Compression: Optimized for compressing high-energy ultrafast laser pulses with minimal distortion.

  • High-Power Laser Systems: Ideal for systems requiring high damage threshold gratings.

  • Spectroscopy and Microscopy: Suitable for advanced laser-based analytical systems.

  • Ultrafast Laser Research: Supports R&D requiring precise pulse compression components.

  • OEM Laser Manufacturing: Integrates into commercial laser products requiring reliable pulse compression performance.