351nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Description
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than semiconductor lithography as a high performance DUV light source.
Because the GIGANEX Series was designed on Gigaphoton’s GT platform and devised for maximum universality, it can be expected to be highly reliable. Also, it has inherited the high output and high oscillating frequency that are the characteristics of the GT Series and can be expected to realize designs that are even more suitable for laser annealing.
351nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Specifications |
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|---|---|
| Gas Mixture: | XeF |
| Wavelength: | 351 nm |
| Pulse Energy: | 1000 mJ |
| Average Power: | 600 W |
| Max Repetition Rate: | 600 Hz |
| Pulse Duration: | 17 ns |
Applications
Expected Fields of Application: FPD manufacturing processes, and flexible device manufacturing processes, Semiconductor manufacturing processes
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How to order?
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Ships from:
Japan
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Frequently Asked Questions
Yes, the GIGANEX laser is highly reliable due to being designed on Gigaphoton's GT platform and devised for maximum universality.
The GIGANEX laser is suitable for FPD manufacturing processes, flexible device manufacturing processes, and semiconductor manufacturing processes.
The GIGANEX laser has a high output of 600W.
The GIGANEX laser has a wavelength of 351nm.
The GIGANEX is a high output-low repetition type laser.