308nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Description
We are convinced that GIGANEX, newly created by consolidating the technology and know-how acquired by Gigaphoton from manufacturing excimer lasers as semiconductor lithography light sources, and combining that technology and know-how with the technology of its customers, can also generate new innovations in fields other than semiconductor lithography as a high performance DUV light source.
Because the GIGANEX Series was designed on Gigaphoton’s GT platform and devised for maximum universality, it can be expected to be highly reliable. Also, it has inherited the high output and high oscillating frequency that are the characteristics of the GT Series and can be expected to realize designs that are even more suitable for laser annealing.
308nm High Output-Low Repetition Type GIGANEX 600W Type Laser
Specifications |
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|---|---|
| Gas Mixture: | XeCl |
| Wavelength: | 308 nm |
| Pulse Energy: | 1000 mJ |
| Average Power: | 600 W |
| Max Repetition Rate: | 600 Hz |
| Pulse Duration: | 17 ns |
Applications
Expected Fields of Application: FPD manufacturing processes, and flexible device manufacturing processes, Semiconductor manufacturing processes
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Ships from:
Japan
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Frequently Asked Questions
The GIGANEX laser is expected to be used in FPD manufacturing processes, flexible device manufacturing processes, and semiconductor manufacturing processes.
The GIGANEX laser has an output power of 600W.
The GIGANEX laser is highly reliable due to being designed on Gigaphoton's GT platform and devised for maximum universality.
The GIGANEX laser is a low repetition type, meaning it has a low repetition rate.
The GIGANEX laser has a wavelength of 308nm.